1. P. Mangthong, M. Kohout, J. Bulíř, Z. Hubička, S. Ono, K. Yamanoi, J. Kaewkhao, K. Kirdsiri, N. Srisittipokakun, J. Olejníček, M. Cadatal-Raduban
    Gadolinium doped silicate glass coated with a photosensitive TiO2 layer prepared by DC magnetron sputtering for compact VUV photodetecter
    Radiation Physics and Chemistry 250 (2027) 114298(1)-114298(9).
  2. P. Mangthong, M. Kohout, J. Bulíř, Z. Hubička, S. Ono, K. Yamanoi, J. Kaewkhao, K. Kirdsiri, N. Srisittipokakun, J. Olejníček, M. Cadatal-Raduban
    Gadolinium doped silicate glass coated with a photosensitive TiO2 layer prepared by DC magnetron sputtering for compact VUV photodetecter
    Radiation Physics and Chemistry 250 (2027) 114298(1)-114298(9).
  3. I. Naiko, R. Hippler, A. Kruth, H. Wulff, D. Chvostová, Ch. A. Helm, J. Wallis, N. Nepomniashchaia, Z. Remeš, J. Olejníček, M. Čada, Z. Hubička
    Plasma diagnostics and deposition of functional zirconia thin films by reactive magnetron sputtering
    Vacuum 254 (2026) 115645(1)-115645(16).
  4. C.S. Ponseca Jr., A. Shuaib, J. Olejníček, M. Kohout, L. Fekete, Z. Hubička, M. Cadatal-Raduban
    Trapping, screening, and turning bimolecular: Charge carrier dynamics in TiO₂ UV photodetectors grown by physical vapor deposition techniques
    Materials Today Communications 55 (2026) 115802(1)-115802(12).
  5. L. Nožka, Z. Hubička, A. Písaříková, J. Krajczewski, P. Schovánek, J. Tomáštík, L. Václavek
    Plasmonic Characteristics of TiN Layers Deposited by ECWR Assisted MF Magnetron Sputtering
    Advanced Physics Research 5 (2026) 00166(1)-00166(10).
  6. R. N. Mekki, H. Mishra, Z. Turek, P. Kašpárek, Z. Hubička, A. Kaňka, P. Kudrna, M. Tichý
    Optical emission spectroscopy and langmuir probe characterization of he:n2:co2 plasma in a DC cylindrical magnetron
    Physica Scripta 101 (2026) 255601(1)-255601(11).
  7. C. Ballage, A. Kapran, O. Vasilovici, A. Bennacef, T. Minea
    Microsecond ion flux mapping in HiPIMS via magnetized QCM probe
    Surface & Coatings Technology 520 (2026) 133047(1)-133047(13).
  8. X. Li, I. Venkrbcová, D. Lundin, M. Čada, Z. Hubička
    Plasma characterization for the reactive HiPIMS process regulation of vanadium oxides
    Plasma Sources Science and Technology 35 (2026) 035003(1)-035003(16).
  9. Z. Turek, T. Mašek, H. Mishra, R. N. Mekki, M. Čada, Z. Hubička, M. Tichý, P. Kudrna
    Investigation of plasma–material interactions on different substrates using a hot tungsten cathode system for liquid metal divertor applications
    Plasma Physics and Controlled Fusion 68 (2026) 035020(1)-035020(16).
  10. P. Sezemský, R. Šimerová, P. Čurda, L. Gonzales-Salgueero, J. Toušek, A. Písaříková, P. Písařík, O. Kylián, I. Del Villar, M. Smietana, V. Straňák
    Beyond single domain sensing: Adapting indium tin oxide thin film crystallinity for enhanced optical and electrochemical performance
    Surfaces and Interfaces 86 (2026) 108724(1)-108724(10).
  11. P. Písařík, Y. Maruyama, Y. Akabe, K. Hibino, M. Kohout, Z. Hubička, K. Kato, M. Nakajima, N. Sarukura, M. Cadatal-Raduban, S. Ono, K. Yamanoi, J. Olejníček
    Reactive sputtering of luminescent YAG:Ce thin films by dual hollow cathode plasma-jet
    Optical Materials 174 (2026) 117970(1)-117970(10).
  12. K. Jirátová, I. Naiko, A. Ostapenko, J. Olejníček, M. Čada, J. Balabánová, M. Koštejn, J. Maixner, P. Topka, F. Kovanda
    Electrochemical deposition of Ni-Co oxides vs. low-temperature hollow cathode plasma jet sputtering on stainless steel meshes: Physicochemical properties and activity in volatile organic compounds oxidation
    Surface & Coatings Technology 520 (2026) 133068(1)-133068(14).
  13. A. Písaříková, H. Krýsová, A. Kapran, P. Písařík, M. Čada, J. Olejníček, R. Hippler, Z. Hubička
    Semiconductor WO3 thin films deposited by pulsed reactive magnetron sputtering
    Materials Science in Semiconductor Processing 186 (2025) 109034(1)-109034(11).
  14. P. Mangthong, M. Kohout, C.S. Ponseca Jr., Z. Hubička, J. Kaewkhao, S. Kothan, K. Kirdsiri, N. Srisittipokakun, J. Olejníček, M. Cadatal-Raduban
    Hybrid detectors for high-energy radiation based on borosilicate glass scintillator doped with Gd3+ covered by photosensitive TiO2 layer
    Radiation Physics and Chemistry 237 (2025) 113010(1)-113010(8).
  15. M. Cadatal-Raduban, Y. Maruyama, K. Hibino, M. Kohout, K. Yamanoi, C.S. Ponseca Jr, Z. Hubička, S. Ono, J. Olejníček
    Direct detection of radiation via luminescence-to-electrical signal conversion in a hybrid Ce:YAP-TiO₂ scintillator
    Surface & Coatings Technology 505 (2025) 132066(1)-132066(7).
  16. K. Hibino, J. Olejníček, K. Yamanoi, C.S. Ponseca Jr., A. Shuaib, Y. Maruyama, A. Písaříková, M. Kohout, M. Čada, A. Kapran, Y. Akabe, N. Sarukura, Z. Hubička, S. Ono, M. Cadatal-Raduban
    Impact of electron cyclotron wave resonance plasma on defect reduction in ZnO thin films
    Scientific Reports 15 (2025) 5555(1)-5555(14).
  17. Z. Remeš, Z. Hubička, P. Hubík
    Optical and Transport Properties of ZnO Thin Films Prepared by Reactive Pulsed Mid-Frequency Sputtering Combined with RF ECWR Plasma
    Nanomaterials 15 (2025) 590(1)-590(14).
  18. A. Kapran, C. Ballage, Z. Hubička, T. Minea
    Effect of magnetron configuration on the spatial distribution of sputtered species in high-power impulse magnetron sputtering (HiPIMS) plasmas
    Vacuum 238 (2025) 114324(1)-114324(8).
  19. L. Kavan, H. Krýsová, M. Zukalová, H. Tarábková, Z. Hubička
    Peculiar photoelectrochemical activity of zinc oxide and tin dioxide
    Journal of Photochemistry and Photobiology A-Chemistry 458 (2025) 115929(1)-115929(11).
  20. D. Cattozzo Mor, A. B. Plšek, P. Asokan, V. Truc Vu, G. Aktug, E. Giordani, E. Ricciardi, J. Perutka, K. Önder, L. Fekete, Z. Hubička, C.J.Huang, J. Dostálek
    Facile Fabrication of Large-Area Biofunctionalized Metallic Nanostructures for High Performance Affinity Plasmonic Biosensors
    Advanced Materials Technologies _ (2025) e00356(1)-e00356(11).
  21. A. Stupakov, T. Kocourek, A. Tarasenko, A. Dejneka, M. Tjunina
    Polaronic Hall mobility in neodymium nickelate films
    Journal of Physics and Chemistry of Solids 207 (2025) 112837(1)-112837(8).
  22. R. Hippler, A. Kapran, H. Wulff, N. Nepomniashchaia, Z. Remeš, J. Olejníček, M. Čada, Z. Hubička
    Energy distribution of positively and negatively charged plasma ions of a pulsed magnetron sputtering discharge in an argon/oxygen gas mixture and deposition of functional ZnO films
    Journal of Vacuum Science & Technology A 18 (2025) 053002(1)-053002(18).
  23. R. N. Mekki, M. Tichý, M. Čada, Z. Hubička
    Application of ECWR for tin removal with prospective use in tokamaks with liquid metal divertor
    Plasma Physics and Controlled Fusion 67 (2025) 055035(1)-055035(8).
  24. D. V. Azamat, L. Jastrabík, M. Fanciulli, A. Dejneka, D. R. Yakovlev, M. Bayer
    Spin echo studies of heavily cobalt-doped ZnO:Mn 2+: Electron spectral diffusion under dynamic nuclear polarization
    Physical Review B 112 (2025) 214421(1)-214421(13).
  25. K. Jirátová, M. Čada, I. Naiko, A. Ostapenko, J. Balabánová, M. Koštejn, J. Maixner, T. Babii, P. Topka, Z. Hubička, F. Kovanda
    Combination of Plasma Jet and Magnetron Sputtering - A New Method for Preparing Thin Ni−Co−Mn Oxide Coatings on Stainless Steel Meshes and Their Efficiency in the Total Oxidation of Volatile Organic Compounds
    Industrial & Engineering Chemistry Research 63 (2024) 18759-18772.
  26. R. Hippler, M. Čada, Z. Hubička
    Energy distribution of negatively and positively charged ions in a magnetron sputtering discharge with a tungsten cathode and a positively biased anode in an argon/oxygen gas mixture
    Plasma Sources Science and Technology 33 (2024) 115006(1)-115006(12).
  27. R. Hippler, M. Čada, A. Knížek, M. Ferus, Z. Hubička
    Generation of Ammonia in a Pulsed Hollow Cathode Discharge Operated in an Ar/H2/N2 Gas Mixture Detected by Fourier Transform Infrared
    ACS Sustainable Chemistry & Engineering 12 (2024) 17443-17449.
  28. A. Tarasenko
    Hydrodynamic fluctuations, diffusion and correlation functions in systems of particles adsorbed on solid surfaces
    Surface Science 746 (2024) 122501(1)-122501(5).
  29. H. Krýsová, V. Mansfeldová, H. Tarábková, A. Písaříková, Z. Hubička, L. Kavan
    High‑quality dense ZnO thin films: work function and photo/electrochemical properties
    Journal of Solid State Electrochemistry 28 (2024) 2531-2546.
  30. A. Kapran, R. Hippler, H. Wulff, J. Olejníček, L. Volfová, A. Písaříková, N. Nepomniashchaia, M. Čada, Z. Hubička
    Crystalline Structure and Optical Properties of Cobalt Nickel Oxide Thin Films Deposited with a Pulsed Hollow-Cathode Discharge in an Ar+O2 Gas Mixture
    Coatings 14 (2024) 319(1)-319(10).
  31. M. Cadatal-Raduban, J. Olejníček, K. Hibino, Y. Maruyama, A. Písaříková, K. Shinohara, T. Asaka, L. Lebedová Volfová, M. Kohout, Z. Jiaqi, Y. Akabe, M. Nakajima, J.A. Harrison, R. Hippler, N. Sarukura, S. Ono, Z. Hubička, K. Yamanoi
    Ultrafast UV Luminescence of ZnO Films: Sub-30 ps Decay Time with Suppressed Visible Component
    Advanced Optical Materials 12 (2024) 2400377(1)-2400377(12).
  32. H. Krýsová, S. Cichoň, A. Kapran, L. Volfová, D. Chvostová, T. Imrich, M. Neumann-Spallart, J. Krýsa, Z. Hubička
    Deposition of Fe2O3:Sn semiconducting thin films by reactive pulsed HiPIMS + ECWR co-sputtering from Fe and Sn targets
    Journal of Photochemistry and Photobiology A-Chemistry 454 (2024) 115676(1)-115676(11).
  33. A. Kapran, C. Ballage, Z. Hubička, T. Minea
    2D analysis of sputtered species transport in high-power impulse magnetron sputtering (HiPIMS) discharge
    Journal of Applied Physics 135 (2024) 173302(1)-173302(14).
  34. P. Niiranen, A. Kapran, H. Nadhom, M. Čada, Z. Hubička, H. Pedersen, D. Lundin
    Plasma electron characterization in electron chemical vapor deposition
    Journal of Vacuum Science & Technology A 42 (2024) 023006(1)-023006(10).
  35. R. Hippler, M. Čada, A. Knížek, M. Ferus, Z. Hubička
    A Pulsed Hollow Cathode Discharge Operated in an Ar/N2/O2 Gas Mixture and the Formation of Nitric Oxide
    Plasma Chemistry and Plasma Processing 44 (2024) 1053-1068.
  36. A. Tarasenko
    Analytical approach for the collective diffusion: Multicomponent mixture of particles coadsorbed on a multisite lattice
    Surface Science 729 (2023) 122225-.
  37. K. Jirátová, M. Čada, I. Naiko, A. Ostapenko, J. Balabánová, M. Koštejn, J. Maixner, T. Babii, P. Topka, K. Soukup, Z. Hubička, F. Kovanda
    Plasma Jet Sputtering as an Efficient Method for the Deposition of Nickel and Cobalt Mixed Oxides on Stainless-Steel Meshes: Application to VOC Oxidation
    Catalysts 13 (2023) 79(1)-79(21).
  38. A. Kapran, V. G. Antunes, Z. Hubička, C. Ballage, T. Minea
    Investigation of the magnetron balancing effect on the ionized flux fraction and deposition rate of sputtered titanium species for the high-power impulse magnetron sputtering pulses of different lengths
    Journal of Vacuum Science & Technology A 41 (2023) 013003(1)-013003(8).
  39. K. Jirátová, P. Soukal, A. Kapran, T. Babii, J. Balabánová, M. Koštejn, M. Čada, J. Maixner, P. Topka, Z. Hubička, F. Kovanda
    Nickel-Copper Oxide Catalysts Deposited on Stainless Steel Meshes by Plasma Jet Sputtering: Comparison with Granular Analogues and Synergistic Effect in VOC Oxidation
    Catalysts 13 (2023) 595(1)-595(21).
  40. V. G. Antunes, M. Rudolph, A. Kapran, H. Hajihoseini, M. A. Raadu, N. Brenning, J. T. Gudmundsson, D. Lundin, T. Minea
    Influence of the magnetic field on the extension of the ionization region in high power impulse magnetron sputtering discharges
    Plasma Sources Science and Technology 32 (2023) 075016(1)-075016(10).
  41. P. Čurda, R. Hippler, M. Čada, O. Kylián, V. Straňák, Z, Z. Hubička
    The role of dimers in the efficient growth of nanoparticles
    Surface & Coatings Technology 473 (2023) 130045(1)-130045(9).
  42. H. Mishra, T. Mašek, Z. Turek, M. Čada, Z. Hubička, P. Kudrna, M. Tichý
    Investigation of Tin Removal for Liquid Metal Tokamak Divertor by Low Pressure Argon Arc with Hot Tungsten Cathode System
    Journal of Fusion Energy 42 (2023) 36(1)-36(12).
  43. R. Hippler, M. Čada, A. Mutzke, Z. Hubička
    Pulse length dependence of a reactive high power impulse magnetron (HiPIMS) discharge
    Plasma Sources Science and Technology 32 (2023) 055013(1)-055013(12).
  44. A. Kapran, R. Hippler, H. Wulff, J. Olejníček, A. Písaříková, M. Čada, Z. Hubička
    Characteristics of a pulsed hollow cathode discharge operated in an Ar+O2 gas mixture and deposition of copper nickel oxide thin films
    Vacuum 215 (2023) 112272(1)-112272(11).
  45. A. Písaříková, J. Olejníček, I. Venkrbcová, L. Nožka, S. Cichoň, A. Azinfar, R. Hippler, C. A. Helm, M. Mašláň, L. Machala, Z. Hubička
    CuFeO2 prepared by electron cyclotron wave resonance-assisted reactive HiPIMS with two magnetrons and radio frequency magnetron sputtering
    Journal of Vacuum Science & Technology A 41 (2023) 063005(1)-063005(13).
  46. A. Písaříková, R. Hippler, H. Wulff, M. Čada, O. Gedeon, P. Jiříček, J. Houdková, J. Olejníček, N. Nepomniashchaia, C. A. Helm, Z. Hubička
    Copper tungsten oxide (CuxWOy) thin films for optical and photoelectrochemical applications deposited by reactive high power impulse magnetron co-sputtering
    Journal of Applied Physics 132 (2022) 215301(1)-215301(13).
  47. J. Olejníček, A. Písaříková, L. Lebedová Volfová, M. Dvořáková, M. Kohout, D. Tvarog, O. Gedeon, H. Wulff, R. Hippler, Z. Hubička
    WO3 and WO3-x thin films prepared by DC hollow cathode discharge
    Vacuum 195 (2022) 110679(1)-110679(10).
  48. M. Cadatal-Raduban, T. Kato, Y. Horiuchi, J. Olejníček, M. Kohout, K. Yamanoi, S. Ono
    Effect of Substrate and Thickness on the Photoconductivity of Nanoparticle Titanium Dioxide Thin Film Vacuum Ultraviolet Photoconductive Detector
    Nanomaterials 12 (2022) 10(1)-10(13).
  49. D. V. Azamat, A. G. Badalyan, N. G. Romanov, M. Hrabovský, L. Jastrabík, A. Dejneka, D. R. Yakovlev, M. Bayer
    Cross-relaxation interactions in ZnO:Mn2+ : The ground state optical pumping
    Applied Physics Letters 120 (2022) 041104(1)-041104(4).
  50. A. Písaříková, R. Hippler, H. Wulff, M. Čada, J. Olejníček, N. Nepomniashchaia, C. A. Helm, Z. Hubička
    Deposition of tungsten oxide films by reactive magnetron sputtering on different substrates.
    Journal of Vacuum Science & Technology A 40 (2022) 063402(1)-063402(7).