Mgr. Zdeněk Hubička, Ph.D.

Zdeněk Hubička
Vedoucí oddělení 25
Kategorie
Ved. věd. pracovník
Sekce (číslo)
Oddělení (číslo)
Telefon
266 05 2995, 266 05 2415, 266 05 2456
E-mail
hubicka [at] fzu.cz
Lokalita
Slovanka
Místnost
O 218
O 330
O 329
  1. R. Hippler, M. Čada, A. Mutzke, Z. Hubička
    Pulse length dependence of a reactive high power impulse magnetron (HiPIMS) discharge
    Plasma Sources Science and Technology 32 (2023) 055013(1)-055013(12).
  2. A. Kapran, R. Hippler, H. Wulff, J. Olejníček, A. Písaříková, M. Čada, Z. Hubička
    Characteristics of a pulsed hollow cathode discharge operated in an Ar+O2 gas mixture and deposition of copper nickel oxide thin films
    Vacuum 215 (2023) 112272(1)-112272(11).
  3. A. Písaříková, J. Olejníček, I. Venkrbcová, L. Nožka, S. Cichoň, A. Azinfar, R. Hippler, C. A. Helm, M. Mašláň, L. Machala, Z. Hubička
    CuFeO2 prepared by electron cyclotron wave resonance-assisted reactive HiPIMS with two magnetrons and radio frequency magnetron sputtering
    Journal of Vacuum Science & Technology A 41 (2023) 063005(1)-063005(13).
  4. H. Mishra, T. Mašek, Z. Turek, M. Čada, Z. Hubička, P. Kudrna, M. Tichý
    Investigation of Tin Removal for Liquid Metal Tokamak Divertor by Low Pressure Argon Arc with Hot Tungsten Cathode System
    Journal of Fusion Energy 42 (2023) 36(1)-36(12).
  5. P. Čurda, R. Hippler, M. Čada, O. Kylián, V. Straňák, Z, Z. Hubička
    The role of dimers in the efficient growth of nanoparticles
    Surface & Coatings Technology 473 (2023) 130045(1)-130045(9).
  6. K. Jirátová, M. Čada, I. Naiko, A. Ostapenko, J. Balabánová, M. Koštejn, J. Maixner, T. Babii, P. Topka, K. Soukup, Z. Hubička, F. Kovanda
    Plasma Jet Sputtering as an Efficient Method for the Deposition of Nickel and Cobalt Mixed Oxides on Stainless-Steel Meshes: Application to VOC Oxidation
    Catalysts 13 (2023) 79(1)-79(21).
  7. A. Kapran, V. G. Antunes, Z. Hubička, C. Ballage, T. Minea
    Investigation of the magnetron balancing effect on the ionized flux fraction and deposition rate of sputtered titanium species for the high-power impulse magnetron sputtering pulses of different lengths
    Journal of Vacuum Science & Technology A 41 (2023) 013003(1)-013003(8).
  8. K. Jirátová, P. Soukal, A. Kapran, T. Babii, J. Balabánová, M. Koštejn, M. Čada, J. Maixner, P. Topka, Z. Hubička, F. Kovanda
    Nickel-Copper Oxide Catalysts Deposited on Stainless Steel Meshes by Plasma Jet Sputtering: Comparison with Granular Analogues and Synergistic Effect in VOC Oxidation
    Catalysts 13 (2023) 595(1)-595(21).
  9. J. Olejníček, A. Písaříková, L. Lebedová Volfová, M. Dvořáková, M. Kohout, D. Tvarog, O. Gedeon, H. Wulff, R. Hippler, Z. Hubička
    WO3 and WO3-x thin films prepared by DC hollow cathode discharge
    Vacuum 195 (2022) 110679(1)-110679(10).
  10. A. Písaříková, R. Hippler, H. Wulff, M. Čada, J. Olejníček, N. Nepomniashchaia, C. A. Helm, Z. Hubička
    Deposition of tungsten oxide films by reactive magnetron sputtering on different substrates.
    Journal of Vacuum Science & Technology A 40 (2022) 063402(1)-063402(7).
  11. J. Vyskočil, P. Mareš, Z. Hubička, M. Čada, T. Mates
    Hybrid HiPIMS + controlled pulsed arc for deposition of hard coatings.
    Surface & Coatings Technology 446 (2022) 128765(1)-128765(6).
  12. R. Hippler, M. Čada, Z. Hubička
    Ion energy distribution of plasma ions of a hollow cathode discharge in Ar + N2 and Ar + O2 gas mixtures
    European Physical Journal D 76 (2022) 214(1)-214(7).
  13. A. Písaříková, R. Hippler, H. Wulff, M. Čada, O. Gedeon, P. Jiříček, J. Houdková, J. Olejníček, N. Nepomniashchaia, C. A. Helm, Z. Hubička
    Copper tungsten oxide (CuxWOy) thin films for optical and photoelectrochemical applications deposited by reactive high power impulse magnetron co-sputtering
    Journal of Applied Physics 132 (2022) 215301(1)-215301(13).
  14. D. Tvarog, J. Olejníček, J. Kratochvíl, P. Kšírová, A. Poruba, Z. Hubička, M. Čada
    Characterization of radical-enhanced atomic layer deposition process based on microwave surface wave generated plasma
    Journal of Applied Physics 130 (2021) 013301(1)-013301(18).
  15. R. Hippler, M. Čada, Z. Hubička
    Direct current and high power impulse magnetron sputtering discharges with a positively biased anode
    Journal of Vacuum Science & Technology A 39 (2021) 043007(1)-043007(10).
  16. P. Sezemsky, D. Burnat, J. Kratochvil, H. Wulff, A. Kruth, K. Lechowicz, M. Janik, R. Bogdanowicz, M. Čada, Z. Hubička, P. Niedziałkowski, W. Białobrzeska, V. Straňák, M. Smietana
    Tailoring properties of indium tin oxide thin films for their work in both electrochemical and optical label-free sensing systems
    Sensors and Actuators B: Chemical 343 (2021) 130173(1)-130173(11).
  17. K. Jirátová, R. Perekrestov, M. Dvořáková, J. Balabánová, M. Koštejn, M. Veselý, M. Čada, P. Topka, D. Pokorná, Z. Hubička, F. Kovanda
    Modification of Cobalt Oxide Electrochemically Deposited on Stainless Steel Meshes with Co-Mn Thin Films Prepared by Magnetron Sputtering: Effect of Preparation Method and Application to Ethanol Oxidation
    Catalysts 11 (2021) 1453-1453(26).
  18. R. Žouželka, J. Olejníček, P. Kšírová, Z. Hubička, J. Duchoň, I. Martiniaková, B. Mužiková, M. Mergl, M. Kalbáč, L. Brabec, M. Kočiřík, M. Remzová, E. Vaněčková, J. Rathouský
    Hierarchical TiO2 Layers Prepared by Plasma Jets
    Nanomaterials 11 (2021) 3254(1)-3254(15).
  19. R. Hippler, M. Čada, P. Kšírová, J. Olejníček, P. Jiříček, J. Houdková, H. Wulff, A. Kruth, C.A. Helm, Z. Hubička
    Deposition of cobalt oxide films by reactive pulsed magnetron sputtering
    Surface & Coatings Technology 405 (2021) 126590(1)-126590(11).
  20. R. Hippler, M. Čada, Z. Hubička
    A positively biased external anode for energy control of plasma ions: hollow cathode and magnetron sputtering discharge.
    Plasma Sources Science and Technology 30 (2021) 045003(1)-045003(15).
  21. J. Olejníček, J. Šmíd, M. Čada, P. Kšírová, M. Kohout, R. Perekrestov, D. Tvarog, Š. Kment, H. Kmentová, Z. Hubička
    High rate deposition of photoactive TiO2 films by hot hollow cathode
    Surface & Coatings Technology 383 (2020) 125256(1)-125256(10).
  22. Z. Hubička, M. Zlámal, J. Olejníček, D. Tvarog, M. Čada, J. Krýsa
    Semiconducting p-Type Copper Iron Oxide Thin Films Deposited by Hybrid Reactive-HiPIMS + ECWR and Reactive-HiPIMS Magnetron Plasma System
    Coatings 10 (2020) 232(1)-232(14).
  23. Z. Hubička, M. Čada, A. Kapran, J. Olejníček, P. Kšírová, M. Zanáška, P. Adámek, M. Tichý
    Plasma Diagnostics in Reactive High-Power Impulse Magnetron Sputtering System Working in Ar + H2S Gas Mixture
    Coatings 10 (2020) 246(1)-246(17).
  24. R. Hippler, M. Čada, Z. Hubička
    Time-resolved Langmuir probe diagnostics of a bipolar high power impulse magnetron sputtering discharge.
    Applied Physics Letters 116 (2020) 064101(1)-064101(4).
  25. H. Hajihoseini, M. Čada, Z. Hubička, S. Ünaldi, M. A. Raadu, N. Brenning, J. T. Gudmundsson, D. Lundin
    Sideways deposition rate and ionized flux fraction in dc and high power impulse magnetron sputtering.
    Journal of Vacuum Science & Technology A 38 (2020) 033009(1)-033009(11).
  26. R. Hippler, M. Čada, Z. Hubička
    Time-resolved diagnostics of a bipolar HiPIMS discharge
    Journal of Applied Physics 127 (2020) 303303(1)-203303(10).
  27. T. Kozák, A. D. Pajdarová, M. Čada, Z. Hubička, P. Mareš, J. Čapek
    Ion energy distributions at substrate in bipolar HiPIMS: effect of positive pulse delay, length and amplitude
    Plasma Sources Science and Technology 29 (2020) 065003(1)-065003(10).
  28. A. D. Pajdarová, T. Kozák, Z. Hubička, M. Čada, P. Mareš, J. Čapek
    Plasma parameters in positive voltage pulses of bipolar HiPIMS discharge determined by Langmuir probe with a sub-microsecond time resolution
    Plasma Sources Science and Technology 29 (2020) 085016(1)-085016(11).
  29. R. Hippler, M. Čada, V. Straňák, C. A. Helm, Z. Hubička
    Pressure dependence of singly and doubly charged ion formation in a HiPIMS discharge
    Journal of Applied Physics 125 (2019) 013301(1)-013301(7).
  30. M. Zanáška, Z. Turek, Z. Hubička, M. Čada, P. Kudrna, M. Tichý
    Floating harmonic probe for diagnostic of pulsed discharges
    Surface & Coatings Technology 357 (2019) 879-885.
  31. J. Olejníček, J. Šmíd, R. Perekrestov, P. Kšírová, J. Rathouský, M. Kohout, M. Dvořáková, Š. Kment, K. Jurek, M. Čada, Z. Hubička
    Co3O4 thin films prepared by hollow cathode discharge
    Surface & Coatings Technology 366 (2019) 303-310.
  32. R. Hippler, M. Čada, V. Straňák, Z. Hubička
    Ion formation in an argon and argon-oxygen gas mixture of a magnetron sputtering discharge
    Journal of Physics Communications 3 (2019) 055011(1)-055011(9).
  33. Z. Hubička, M.Zlámal, M. Čada, Š. Kment, J.Krýsa
    Photo-electrochemical stability of copper oxide photocathodes deposited by reactive high power impulse magnetron sputtering
    Catalysis Today 328 (2019) 29-34.
  34. R. Perekrestov, A. Spesyvyi, J. Maixner, K. Mašek, O. Leiko, I. Khalakhan, J. Maňák, P. Kšírová, Z. Hubička, M. Čada
    The comparative study of electrical, optical and catalytic properties of Co3O4 thin nanocrystalline films prepared by reactive high-power impulse and radio frequency magnetron sputtering.
    Thin Solid Films 686 (2019) 137427(1)-137427(9).
  35. M. Zanáška, P. Kudrna, M. Čada, M. Tichý, Z. Hubička
    In-situ impedance spectroscopy of a plasma-semiconductor thin film system during reactive sputter deposition
    Journal of Applied Physics 126 (2019) 023301(1)-023301(12).
  36. H. Hajihoseini, M. Čada, Z. Hubička, S. Ünaldi, M. A. Raadu, N. Brenning, J. T. Gudmundsson, D. Lundin
    The Effect of Magnetic Field Strength and Geometry on the Deposition Rate and Ionized Flux Fraction in the HiPIMS Discharge
    Plasma 2 (2019) 201-221.
  37. K. Jirátová, R. Perekrestov, M. Dvořáková, J. Balabánová, P. Topka, M. Koštejn, J. Olejníček, M. Čada, Z. Hubička, F. Kovanda
    Cobalt Oxide Catalysts in the Form of Thin Films Prepared by Magnetron Sputtering on Stainless-Steel Meshes: Performance in Ethanol Oxidation
    Catalysts 9 (2019) 806-824.
  38. Petr Sezemský, V. Straňák, Jiří Kratochvíl, M. Čada, R. Hippler, Miroslav Hrabovský, Z. Hubička
    Modified high frequency probe approach for diagnostics of highly reactive plasma
    Plasma Sources Science and Technology 28 (2019) 115009(1)-115009(10).
  39. R. Hippler, M. Čada, V, V. Straňák, Z. Hubička
    Time-resolved optical emission spectroscopy of a unipolar and a bipolar pulsed magnetron sputtering discharge in an argon/oxygen gas mixture with a cobalt target
    Plasma Sources Science and Technology 28 (2019) 115020(1)-115020(13).
  40. M. Dvořáková, R. Perekrestov, P. Kšírová, J. Balabánová, K. Jirátová, J. Maixner, P. Topka, J. Rathouský, M. Koštejn, M. Čada, Z. Hubička, F. Kovanda
    Preparation of cobalt oxide catalysts on stainless steel wire mesh by combination of magnetron sputtering and electrochemical deposition
    Catalysis Today 334 (2019) 13-23.
  41. V. Straňák, R. Bogdanowicz, P. Sezemsky, H. Wulff, A. Kruth, M. Smietana, J. Kratochvil, M. Čada, Z. Hubička
    Towards high quality ITO coatings: The impact of nitrogen admixture in HiPIMS discharges
    Surface & Coatings Technology 335 (2018) 126-133.
  42. M. Zanáška, Z. Hubička, M. Čada, P. Kudrna, M. Tichý
    Floating harmonic probe measurements in the low-temperature plasma jet deposition system
    Journal of Physics D: Applied Physics 51 (2018) 025205(1)-025205(8).
  43. V. Straňák, Z. Hubička, M. Čada, R. Bogdanowicz, H. Wulff, C. A. Helm, R. Hippler
    Influence of reactive oxygen species during deposition of iron oxide films by high power impulse magnetron sputtering
    Journal of Physics D: Applied Physics 51 (2018) 095205(1)-095205(12).
  44. J. Olejníček, M. Zlámal, Z. Hubička, R.Perekrestov, P. Kšírová, M. Čada, Š. Kment, J.Krýsa
    Fe-Ti alloy layer plasma deposition – Monitoring of plasma parameters and properties of deposited alloys, anodization and photoelectrochemical characterization
    Catalysis Today 313 (2018) 239-244.
  45. H. Kmentová, Š. Kment, Z. Hubička, Z. Remeš, J. Olejníček, M. Čada, J. Krýsa, R. Zbořil
    Thermal sulfidation of α-Fe2O3 hematite to FeS2 pyrite thin electrodes: Correlation between surface morphology and photoelectrochemical functionality
    Catalysis Today 313 (2018) 224-230.
  46. J.Krýsa, A. Němečková, M. Zlámal, T. Kotrla, M. Baudys, Š. Kment, Z. Hubička, M. Neumann-Spallart
    a-Fe2O3/TiO2 stratified photoanodes.
    Journal of Photochemistry and Photobiology A-Chemistry 366 (2018) 12-17.
  47. M. Zelný, Š. Kment, R. Čtvrtlík, Š. Pausova, H. Kmentova, J. Tomaštík, Z. Hubička, Y. Rambabu, J. Krýsa, A. Naldoni, P. Schmuki, R. Zboril
    TiO2 Nanotubes on Transparent Substrates: Control of Film Microstructure and Photoelectrochemical Water Splitting Performance
    Catalysts 8 (2018)25.
  48. P. Adámek, J. Olejníček, Z. Hubička, M. Čada, Š. Kment, M. Kohout, H.T. Do
    System for time-resolved laser absorption spectroscopy and its application to high-power impulse magnetron sputtering
    Review of Scientific Instruments 88 (2017) 023105-1-023105-8.
  49. J. Olejníček, M. Dvořáková, Š. Kment, Z. Hubička, H. Kmentová, P. Kšírová, M. Čada, M. Zlámal, J. Krýsa
    WO3 thin films prepared by sedimentation and plasma sputtering
    Chemical Engineering Journal 318 (2017) 281-288.
  50. V. Straňák, J. Kratochvíl, J. Olejníček, P. Kšírová, P. Sezemský, M. Čada, Z. Hubička
    Enhanced oxidation of TiO2 films prepared by high power impulse magnetron sputtering running in metallic mode
    Journal of Applied Physics 121 (2017) 171914(1)-171914(9).