1. A. Písaříková, H. Krýsova, A. Kapran, P. Písařík, M. Čada, J. Olejníček, R. Hippler, Z. Hubička
    Semiconductor WO3 thin films deposited by pulsed reactive magnetron sputtering
    Materials Science in Semiconductor Processing 186 (2025) 109034(1)-109034(11).
  2. H. Krysová, V. Mansfeldová, H. Tarábková, A. Písaříková, Z. Hubička, L. Kavan
    High‑quality dense ZnO thin films: work function and photo/electrochemical properties
    Journal of Solid State Electrochemistry 28 (2024) 2531-2546.
  3. A. Kapran, R. Hippler, H. Wulff, J. Olejníček, L. Volfová, A. Písaříková, N. Nepomniashchaia, M. Čada, Z. Hubička
    Crystalline Structure and Optical Properties of Cobalt Nickel Oxide Thin Films Deposited with a Pulsed Hollow-Cathode Discharge in an Ar+O2 Gas Mixture
    Coatings 14 (2024) 319(1)-319(10).
  4. M. Cadatal-Raduban, J. Olejníček, K. Hibino, Y. Maruyama, A. Písaříková, K. Shinohara, T. Asaka, L. Lebedová Volfová, M. Kohout, Z. Jiaqi, Y. Akabe, M. Nakajima, J.A. Harrison, R. Hippler, N. Sarukura, S. Ono, Z. Hubička, K. Yamanoi
    Ultrafast UV Luminescence of ZnO Films: Sub-30 ps Decay Time with Suppressed Visible Component
    Advanced Optical Materials 12 (2024) 2400377(1)-2400377(12).
  5. H. Krýsová, S. Cichoň, A. Kapran, L. Volfová, D. Chvostová, T. Imrich, M. Neumann-Spallart, J. Krýsa, Z. Hubička
    Deposition of Fe2O3:Sn semiconducting thin films by reactive pulsed HiPIMS + ECWR co-sputtering from Fe and Sn targets
    Journal of Photochemistry and Photobiology A-Chemistry 454 (2024) 115676(1)-115676(11).
  6. A. Kapran, C. Ballage, Z. Hubička, T. Minea
    2D analysis of sputtered species transport in high-power impulse magnetron sputtering (HiPIMS) discharge
    Journal of Applied Physics 135 (2024) 173302(1)-173302(14).
  7. P. Niiranen, A. Kapran, H. Nadhom, M. Čada, Z. Hubička, H. Pedersen, D. Lundin
    Plasma electron characterization in electron chemical vapor deposition
    Journal of Vacuum Science & Technology A 42 (2024) 023006(1)-023006(10).
  8. R. Hippler, M. Čada, A. Knížek, M. Ferus, Z. Hubička
    A Pulsed Hollow Cathode Discharge Operated in an Ar/N2/O2 Gas Mixture and the Formation of Nitric Oxide
    Plasma Chemistry and Plasma Processing 44 (2024) 1053-1068.
  9. K. Jirátová, M. Čada, I. Naiko, A. Ostapenko, J. Balabánová, M. Koštejn, J. Maixner, T. Babii, P. Topka, Z. Hubička, F. Kovanda
    Combination of Plasma Jet and Magnetron Sputtering - A New Method for Preparing Thin Ni−Co−Mn Oxide Coatings on Stainless Steel Meshes and Their Efficiency in the Total Oxidation of Volatile Organic Compounds
    Industrial & Engineering Chemistry Research 63 (2024) 18759-18772.
  10. R. Hippler, M. Čada, Z. Hubička
    Energy distribution of negatively and positively charged ions in a magnetron sputtering discharge with a tungsten cathode and a positively biased anode in an argon/oxygen gas mixture
    Plasma Sources Science and Technology 33 (2024) 115006(1)-115006(12).
  11. R. Hippler, M. Čada, A. Knížek, M. Ferus, Z. Hubička
    Generation of Ammonia in a Pulsed Hollow Cathode Discharge Operated in an Ar/H2/N2 Gas Mixture Detected by Fourier Transform Infrared
    ACS Sustainable Chemistry & Engineering 12 (2024) 17443-17449.
  12. A. Kapran, V. G. Antunes, Z. Hubička, C. Ballage, T. Minea
    Investigation of the magnetron balancing effect on the ionized flux fraction and deposition rate of sputtered titanium species for the high-power impulse magnetron sputtering pulses of different lengths
    Journal of Vacuum Science & Technology A 41 (2023) 013003(1)-013003(8).
  13. K. Jirátová, P. Soukal, A. Kapran, T. Babii, J. Balabánová, M. Koštejn, M. Čada, J. Maixner, P. Topka, Z. Hubička, F. Kovanda
    Nickel-Copper Oxide Catalysts Deposited on Stainless Steel Meshes by Plasma Jet Sputtering: Comparison with Granular Analogues and Synergistic Effect in VOC Oxidation
    Catalysts 13 (2023) 595(1)-595(21).
  14. K. Jirátová, M. Čada, I. Naiko, A. Ostapenko, J. Balabánová, M. Koštejn, J. Maixner, T. Babii, P. Topka, K. Soukup, Z. Hubička, F. Kovanda
    Plasma Jet Sputtering as an Efficient Method for the Deposition of Nickel and Cobalt Mixed Oxides on Stainless-Steel Meshes: Application to VOC Oxidation
    Catalysts 13 (2023) 79(1)-79(21).
  15. P. Čurda, R. Hippler, M. Čada, O. Kylián, V. Straňák, Z, Z. Hubička
    The role of dimers in the efficient growth of nanoparticles
    Surface & Coatings Technology 473 (2023) 130045(1)-130045(9).
  16. R. Hippler, M. Čada, A. Mutzke, Z. Hubička
    Pulse length dependence of a reactive high power impulse magnetron (HiPIMS) discharge
    Plasma Sources Science and Technology 32 (2023) 055013(1)-055013(12).
  17. A. Kapran, R. Hippler, H. Wulff, J. Olejníček, A. Písaříková, M. Čada, Z. Hubička
    Characteristics of a pulsed hollow cathode discharge operated in an Ar+O2 gas mixture and deposition of copper nickel oxide thin films
    Vacuum 215 (2023) 112272(1)-112272(11).
  18. A. Písaříková, J. Olejníček, I. Venkrbcová, L. Nožka, S. Cichoň, A. Azinfar, R. Hippler, C. A. Helm, M. Mašláň, L. Machala, Z. Hubička
    CuFeO2 prepared by electron cyclotron wave resonance-assisted reactive HiPIMS with two magnetrons and radio frequency magnetron sputtering
    Journal of Vacuum Science & Technology A 41 (2023) 063005(1)-063005(13).
  19. H. Mishra, T. Mašek, Z. Turek, M. Čada, Z. Hubička, P. Kudrna, M. Tichý
    Investigation of Tin Removal for Liquid Metal Tokamak Divertor by Low Pressure Argon Arc with Hot Tungsten Cathode System
    Journal of Fusion Energy 42 (2023) 36(1)-36(12).
  20. A. Písaříková, R. Hippler, H. Wulff, M. Čada, J. Olejníček, N. Nepomniashchaia, C. A. Helm, Z. Hubička
    Deposition of tungsten oxide films by reactive magnetron sputtering on different substrates.
    Journal of Vacuum Science & Technology A 40 (2022) 063402(1)-063402(7).
  21. J. Vyskočil, P. Mareš, Z. Hubička, M. Čada, T. Mates
    Hybrid HiPIMS + controlled pulsed arc for deposition of hard coatings.
    Surface & Coatings Technology 446 (2022) 128765(1)-128765(6).
  22. R. Hippler, M. Čada, Z. Hubička
    Ion energy distribution of plasma ions of a hollow cathode discharge in Ar + N2 and Ar + O2 gas mixtures
    European Physical Journal D 76 (2022) 214(1)-214(7).
  23. A. Písaříková, R. Hippler, H. Wulff, M. Čada, O. Gedeon, P. Jiříček, J. Houdková, J. Olejníček, N. Nepomniashchaia, C. A. Helm, Z. Hubička
    Copper tungsten oxide (CuxWOy) thin films for optical and photoelectrochemical applications deposited by reactive high power impulse magnetron co-sputtering
    Journal of Applied Physics 132 (2022) 215301(1)-215301(13).
  24. J. Olejníček, A. Písaříková, L. Lebedová Volfová, M. Dvořáková, M. Kohout, D. Tvarog, O. Gedeon, H. Wulff, R. Hippler, Z. Hubička
    WO3 and WO3-x thin films prepared by DC hollow cathode discharge
    Vacuum 195 (2022) 110679(1)-110679(10).
  25. R. Hippler, M. Čada, P. Kšírová, J. Olejníček, P. Jiříček, J. Houdková, H. Wulff, A. Kruth, C.A. Helm, Z. Hubička
    Deposition of cobalt oxide films by reactive pulsed magnetron sputtering
    Surface & Coatings Technology 405 (2021) 126590(1)-126590(11).
  26. D. Tvarog, J. Olejníček, J. Kratochvíl, P. Kšírová, A. Poruba, Z. Hubička, M. Čada
    Characterization of radical-enhanced atomic layer deposition process based on microwave surface wave generated plasma
    Journal of Applied Physics 130 (2021) 013301(1)-013301(18).
  27. R. Hippler, M. Čada, Z. Hubička
    Direct current and high power impulse magnetron sputtering discharges with a positively biased anode
    Journal of Vacuum Science & Technology A 39 (2021) 043007(1)-043007(10).
  28. P. Sezemsky, D. Burnat, J. Kratochvil, H. Wulff, A. Kruth, K. Lechowicz, M. Janik, R. Bogdanowicz, M. Čada, Z. Hubička, P. Niedziałkowski, W. Białobrzeska, V. Straňák, M. Smietana
    Tailoring properties of indium tin oxide thin films for their work in both electrochemical and optical label-free sensing systems
    Sensors and Actuators B: Chemical 343 (2021) 130173(1)-130173(11).
  29. R. Hippler, M. Čada, Z. Hubička
    A positively biased external anode for energy control of plasma ions: hollow cathode and magnetron sputtering discharge.
    Plasma Sources Science and Technology 30 (2021) 045003(1)-045003(15).
  30. K. Jirátová, R. Perekrestov, M. Dvořáková, J. Balabánová, M. Koštejn, M. Veselý, M. Čada, P. Topka, D. Pokorná, Z. Hubička, F. Kovanda
    Modification of Cobalt Oxide Electrochemically Deposited on Stainless Steel Meshes with Co-Mn Thin Films Prepared by Magnetron Sputtering: Effect of Preparation Method and Application to Ethanol Oxidation
    Catalysts 11 (2021) 1453-1453(26).
  31. R. Žouželka, J. Olejníček, P. Kšírová, Z. Hubička, J. Duchoň, I. Martiniaková, B. Mužiková, M. Mergl, M. Kalbáč, L. Brabec, M. Kočiřík, M. Remzová, E. Vaněčková, J. Rathouský
    Hierarchical TiO2 Layers Prepared by Plasma Jets
    Nanomaterials 11 (2021) 3254(1)-3254(15).
  32. A. D. Pajdarová, T. Kozák, Z. Hubička, M. Čada, P. Mareš, J. Čapek
    Plasma parameters in positive voltage pulses of bipolar HiPIMS discharge determined by Langmuir probe with a sub-microsecond time resolution
    Plasma Sources Science and Technology 29 (2020) 085016(1)-085016(11).
  33. H. Hajihoseini, M. Čada, Z. Hubička, S. Ünaldi, M. A. Raadu, N. Brenning, J. T. Gudmundsson, D. Lundin
    Sideways deposition rate and ionized flux fraction in dc and high power impulse magnetron sputtering.
    Journal of Vacuum Science & Technology A 38 (2020) 033009(1)-033009(11).
  34. J. Olejníček, J. Šmíd, M. Čada, P. Kšírová, M. Kohout, R. Perekrestov, D. Tvarog, Š. Kment, H. Kmentová, Z. Hubička
    High rate deposition of photoactive TiO2 films by hot hollow cathode
    Surface & Coatings Technology 383 (2020) 125256(1)-125256(10).
  35. Z. Hubička, M. Zlámal, J. Olejníček, D. Tvarog, M. Čada, J. Krýsa
    Semiconducting p-Type Copper Iron Oxide Thin Films Deposited by Hybrid Reactive-HiPIMS + ECWR and Reactive-HiPIMS Magnetron Plasma System
    Coatings 10 (2020) 232(1)-232(14).
  36. Z. Hubička, M. Čada, A. Kapran, J. Olejníček, P. Kšírová, M. Zanáška, P. Adámek, M. Tichý
    Plasma Diagnostics in Reactive High-Power Impulse Magnetron Sputtering System Working in Ar + H2S Gas Mixture
    Coatings 10 (2020) 246(1)-246(17).
  37. R. Hippler, M. Čada, Z. Hubička
    Time-resolved Langmuir probe diagnostics of a bipolar high power impulse magnetron sputtering discharge.
    Applied Physics Letters 116 (2020) 064101(1)-064101(4).
  38. R. Hippler, M. Čada, Z. Hubička
    Time-resolved diagnostics of a bipolar HiPIMS discharge
    Journal of Applied Physics 127 (2020) 303303(1)-203303(10).
  39. T. Kozák, A. D. Pajdarová, M. Čada, Z. Hubička, P. Mareš, J. Čapek
    Ion energy distributions at substrate in bipolar HiPIMS: effect of positive pulse delay, length and amplitude
    Plasma Sources Science and Technology 29 (2020) 065003(1)-065003(10).
  40. R. Perekrestov, A. Spesyvyi, J. Maixner, K. Mašek, O. Leiko, I. Khalakhan, J. Maňák, P. Kšírová, Z. Hubička, M. Čada
    The comparative study of electrical, optical and catalytic properties of Co3O4 thin nanocrystalline films prepared by reactive high-power impulse and radio frequency magnetron sputtering.
    Thin Solid Films 686 (2019) 137427(1)-137427(9).
  41. M. Zanáška, P. Kudrna, M. Čada, M. Tichý, Z. Hubička
    In-situ impedance spectroscopy of a plasma-semiconductor thin film system during reactive sputter deposition
    Journal of Applied Physics 126 (2019) 023301(1)-023301(12).
  42. H. Hajihoseini, M. Čada, Z. Hubička, S. Ünaldi, M. A. Raadu, N. Brenning, J. T. Gudmundsson, D. Lundin
    The Effect of Magnetic Field Strength and Geometry on the Deposition Rate and Ionized Flux Fraction in the HiPIMS Discharge
    Plasma 2 (2019) 201-221.
  43. K. Jirátová, R. Perekrestov, M. Dvořáková, J. Balabánová, P. Topka, M. Koštejn, J. Olejníček, M. Čada, Z. Hubička, F. Kovanda
    Cobalt Oxide Catalysts in the Form of Thin Films Prepared by Magnetron Sputtering on Stainless-Steel Meshes: Performance in Ethanol Oxidation
    Catalysts 9 (2019) 806-824.
  44. R. Hippler, M. Čada, V. Straňák, C. A. Helm, Z. Hubička
    Pressure dependence of singly and doubly charged ion formation in a HiPIMS discharge
    Journal of Applied Physics 125 (2019) 013301(1)-013301(7).
  45. M. Zanáška, Z. Turek, Z. Hubička, M. Čada, P. Kudrna, M. Tichý
    Floating harmonic probe for diagnostic of pulsed discharges
    Surface & Coatings Technology 357 (2019) 879-885.
  46. R. Hippler, M. Čada, V. Straňák, Z. Hubička
    Ion formation in an argon and argon-oxygen gas mixture of a magnetron sputtering discharge
    Journal of Physics Communications 3 (2019) 055011(1)-055011(9).
  47. Z. Hubička, M.Zlámal, M. Čada, Š. Kment, J.Krýsa
    Photo-electrochemical stability of copper oxide photocathodes deposited by reactive high power impulse magnetron sputtering
    Catalysis Today 328 (2019) 29-34.
  48. Petr Sezemský, V. Straňák, Jiří Kratochvíl, M. Čada, R. Hippler, Miroslav Hrabovský, Z. Hubička
    Modified high frequency probe approach for diagnostics of highly reactive plasma
    Plasma Sources Science and Technology 28 (2019) 115009(1)-115009(10).
  49. R. Hippler, M. Čada, V, V. Straňák, Z. Hubička
    Time-resolved optical emission spectroscopy of a unipolar and a bipolar pulsed magnetron sputtering discharge in an argon/oxygen gas mixture with a cobalt target
    Plasma Sources Science and Technology 28 (2019) 115020(1)-115020(13).
  50. M. Dvořáková, R. Perekrestov, P. Kšírová, J. Balabánová, K. Jirátová, J. Maixner, P. Topka, J. Rathouský, M. Koštejn, M. Čada, Z. Hubička, F. Kovanda
    Preparation of cobalt oxide catalysts on stainless steel wire mesh by combination of magnetron sputtering and electrochemical deposition
    Catalysis Today 334 (2019) 13-23.