1. A. Písaříková, H. Krýsová, A. Kapran, P. Písařík, M. Čada, J. Olejníček, R. Hippler, Z. Hubička
    Semiconductor WO3 thin films deposited by pulsed reactive magnetron sputtering
    Materials Science in Semiconductor Processing 186 (2025) 109034(1)-109034(11).
  2. M. Cadatal-Raduban, Y. Maruyama, K. Hibino, M. Kohout, K. Yamanoi, C.S. Ponseca Jr, Z. Hubička, S. Ono, J. Olejníček
    Direct detection of radiation via luminescence-to-electrical signal conversion in a hybrid Ce:YAP-TiO₂ scintillator
    Surface & Coatings Technology 505 (2025) 132066(1)-132066(7).
  3. K. Hibino, J. Olejníček, K. Yamanoi, C.S. Ponseca Jr., A. Shuaib, Y. Maruyama, A. Písaříková, M. Kohout, M. Čada, A. Kapran, Y. Akabe, N. Sarukura, Z. Hubička, S. Ono, M. Cadatal-Raduban
    Impact of electron cyclotron wave resonance plasma on defect reduction in ZnO thin films
    Scientific Reports 15 (2025) 5555(1)-5555(14).
  4. Z. Remeš, Z. Hubička, P. Hubík
    Optical and Transport Properties of ZnO Thin Films Prepared by Reactive Pulsed Mid-Frequency Sputtering Combined with RF ECWR Plasma
    Nanomaterials 15 (2025) 590(1)-590(14).
  5. A. Kapran, C. Ballage, Z. Hubička, T. Minea
    Effect of magnetron configuration on the spatial distribution of sputtered species in high-power impulse magnetron sputtering (HiPIMS) plasmas
    Vacuum 238 (2025) 114324(1)-114324(8).
  6. L. Kavan, H. Krýsová, M. Zukalová, H. Tarábková, Z. Hubička
    Peculiar photoelectrochemical activity of zinc oxide and tin dioxide
    Journal of Photochemistry and Photobiology A-Chemistry 458 (2025) 115929(1)-115929(11).
  7. K. Jirátová, M. Čada, I. Naiko, A. Ostapenko, J. Balabánová, M. Koštejn, J. Maixner, T. Babii, P. Topka, Z. Hubička, F. Kovanda
    Combination of Plasma Jet and Magnetron Sputtering - A New Method for Preparing Thin Ni−Co−Mn Oxide Coatings on Stainless Steel Meshes and Their Efficiency in the Total Oxidation of Volatile Organic Compounds
    Industrial & Engineering Chemistry Research 63 (2024) 18759-18772.
  8. R. Hippler, M. Čada, Z. Hubička
    Energy distribution of negatively and positively charged ions in a magnetron sputtering discharge with a tungsten cathode and a positively biased anode in an argon/oxygen gas mixture
    Plasma Sources Science and Technology 33 (2024) 115006(1)-115006(12).
  9. R. Hippler, M. Čada, A. Knížek, M. Ferus, Z. Hubička
    Generation of Ammonia in a Pulsed Hollow Cathode Discharge Operated in an Ar/H2/N2 Gas Mixture Detected by Fourier Transform Infrared
    ACS Sustainable Chemistry & Engineering 12 (2024) 17443-17449.
  10. H. Krýsová, V. Mansfeldová, H. Tarábková, A. Písaříková, Z. Hubička, L. Kavan
    High‑quality dense ZnO thin films: work function and photo/electrochemical properties
    Journal of Solid State Electrochemistry 28 (2024) 2531-2546.
  11. A. Kapran, R. Hippler, H. Wulff, J. Olejníček, L. Volfová, A. Písaříková, N. Nepomniashchaia, M. Čada, Z. Hubička
    Crystalline Structure and Optical Properties of Cobalt Nickel Oxide Thin Films Deposited with a Pulsed Hollow-Cathode Discharge in an Ar+O2 Gas Mixture
    Coatings 14 (2024) 319(1)-319(10).
  12. M. Cadatal-Raduban, J. Olejníček, K. Hibino, Y. Maruyama, A. Písaříková, K. Shinohara, T. Asaka, L. Lebedová Volfová, M. Kohout, Z. Jiaqi, Y. Akabe, M. Nakajima, J.A. Harrison, R. Hippler, N. Sarukura, S. Ono, Z. Hubička, K. Yamanoi
    Ultrafast UV Luminescence of ZnO Films: Sub-30 ps Decay Time with Suppressed Visible Component
    Advanced Optical Materials 12 (2024) 2400377(1)-2400377(12).
  13. H. Krýsová, S. Cichoň, A. Kapran, L. Volfová, D. Chvostová, T. Imrich, M. Neumann-Spallart, J. Krýsa, Z. Hubička
    Deposition of Fe2O3:Sn semiconducting thin films by reactive pulsed HiPIMS + ECWR co-sputtering from Fe and Sn targets
    Journal of Photochemistry and Photobiology A-Chemistry 454 (2024) 115676(1)-115676(11).
  14. A. Kapran, C. Ballage, Z. Hubička, T. Minea
    2D analysis of sputtered species transport in high-power impulse magnetron sputtering (HiPIMS) discharge
    Journal of Applied Physics 135 (2024) 173302(1)-173302(14).
  15. P. Niiranen, A. Kapran, H. Nadhom, M. Čada, Z. Hubička, H. Pedersen, D. Lundin
    Plasma electron characterization in electron chemical vapor deposition
    Journal of Vacuum Science & Technology A 42 (2024) 023006(1)-023006(10).
  16. R. Hippler, M. Čada, A. Knížek, M. Ferus, Z. Hubička
    A Pulsed Hollow Cathode Discharge Operated in an Ar/N2/O2 Gas Mixture and the Formation of Nitric Oxide
    Plasma Chemistry and Plasma Processing 44 (2024) 1053-1068.
  17. A. Písaříková, J. Olejníček, I. Venkrbcová, L. Nožka, S. Cichoň, A. Azinfar, R. Hippler, C. A. Helm, M. Mašláň, L. Machala, Z. Hubička
    CuFeO2 prepared by electron cyclotron wave resonance-assisted reactive HiPIMS with two magnetrons and radio frequency magnetron sputtering
    Journal of Vacuum Science & Technology A 41 (2023) 063005(1)-063005(13).
  18. H. Mishra, T. Mašek, Z. Turek, M. Čada, Z. Hubička, P. Kudrna, M. Tichý
    Investigation of Tin Removal for Liquid Metal Tokamak Divertor by Low Pressure Argon Arc with Hot Tungsten Cathode System
    Journal of Fusion Energy 42 (2023) 36(1)-36(12).
  19. K. Jirátová, M. Čada, I. Naiko, A. Ostapenko, J. Balabánová, M. Koštejn, J. Maixner, T. Babii, P. Topka, K. Soukup, Z. Hubička, F. Kovanda
    Plasma Jet Sputtering as an Efficient Method for the Deposition of Nickel and Cobalt Mixed Oxides on Stainless-Steel Meshes: Application to VOC Oxidation
    Catalysts 13 (2023) 79(1)-79(21).
  20. P. Čurda, R. Hippler, M. Čada, O. Kylián, V. Straňák, Z, Z. Hubička
    The role of dimers in the efficient growth of nanoparticles
    Surface & Coatings Technology 473 (2023) 130045(1)-130045(9).
  21. R. Hippler, M. Čada, A. Mutzke, Z. Hubička
    Pulse length dependence of a reactive high power impulse magnetron (HiPIMS) discharge
    Plasma Sources Science and Technology 32 (2023) 055013(1)-055013(12).
  22. A. Kapran, R. Hippler, H. Wulff, J. Olejníček, A. Písaříková, M. Čada, Z. Hubička
    Characteristics of a pulsed hollow cathode discharge operated in an Ar+O2 gas mixture and deposition of copper nickel oxide thin films
    Vacuum 215 (2023) 112272(1)-112272(11).
  23. K. Jirátová, P. Soukal, A. Kapran, T. Babii, J. Balabánová, M. Koštejn, M. Čada, J. Maixner, P. Topka, Z. Hubička, F. Kovanda
    Nickel-Copper Oxide Catalysts Deposited on Stainless Steel Meshes by Plasma Jet Sputtering: Comparison with Granular Analogues and Synergistic Effect in VOC Oxidation
    Catalysts 13 (2023) 595(1)-595(21).
  24. A. Kapran, V. G. Antunes, Z. Hubička, C. Ballage, T. Minea
    Investigation of the magnetron balancing effect on the ionized flux fraction and deposition rate of sputtered titanium species for the high-power impulse magnetron sputtering pulses of different lengths
    Journal of Vacuum Science & Technology A 41 (2023) 013003(1)-013003(8).
  25. A. Písaříková, R. Hippler, H. Wulff, M. Čada, O. Gedeon, P. Jiříček, J. Houdková, J. Olejníček, N. Nepomniashchaia, C. A. Helm, Z. Hubička
    Copper tungsten oxide (CuxWOy) thin films for optical and photoelectrochemical applications deposited by reactive high power impulse magnetron co-sputtering
    Journal of Applied Physics 132 (2022) 215301(1)-215301(13).
  26. J. Olejníček, A. Písaříková, L. Lebedová Volfová, M. Dvořáková, M. Kohout, D. Tvarog, O. Gedeon, H. Wulff, R. Hippler, Z. Hubička
    WO3 and WO3-x thin films prepared by DC hollow cathode discharge
    Vacuum 195 (2022) 110679(1)-110679(10).
  27. A. Písaříková, R. Hippler, H. Wulff, M. Čada, J. Olejníček, N. Nepomniashchaia, C. A. Helm, Z. Hubička
    Deposition of tungsten oxide films by reactive magnetron sputtering on different substrates.
    Journal of Vacuum Science & Technology A 40 (2022) 063402(1)-063402(7).
  28. J. Vyskočil, P. Mareš, Z. Hubička, M. Čada, T. Mates
    Hybrid HiPIMS + controlled pulsed arc for deposition of hard coatings.
    Surface & Coatings Technology 446 (2022) 128765(1)-128765(6).
  29. R. Hippler, M. Čada, Z. Hubička
    Ion energy distribution of plasma ions of a hollow cathode discharge in Ar + N2 and Ar + O2 gas mixtures
    European Physical Journal D 76 (2022) 214(1)-214(7).
  30. K. Jirátová, R. Perekrestov, M. Dvořáková, J. Balabánová, M. Koštejn, M. Veselý, M. Čada, P. Topka, D. Pokorná, Z. Hubička, F. Kovanda
    Modification of Cobalt Oxide Electrochemically Deposited on Stainless Steel Meshes with Co-Mn Thin Films Prepared by Magnetron Sputtering: Effect of Preparation Method and Application to Ethanol Oxidation
    Catalysts 11 (2021) 1453-1453(26).
  31. R. Žouželka, J. Olejníček, P. Kšírová, Z. Hubička, J. Duchoň, I. Martiniaková, B. Mužiková, M. Mergl, M. Kalbáč, L. Brabec, M. Kočiřík, M. Remzová, E. Vaněčková, J. Rathouský
    Hierarchical TiO2 Layers Prepared by Plasma Jets
    Nanomaterials 11 (2021) 3254(1)-3254(15).
  32. R. Hippler, M. Čada, Z. Hubička
    A positively biased external anode for energy control of plasma ions: hollow cathode and magnetron sputtering discharge.
    Plasma Sources Science and Technology 30 (2021) 045003(1)-045003(15).
  33. D. Tvarog, J. Olejníček, J. Kratochvíl, P. Kšírová, A. Poruba, Z. Hubička, M. Čada
    Characterization of radical-enhanced atomic layer deposition process based on microwave surface wave generated plasma
    Journal of Applied Physics 130 (2021) 013301(1)-013301(18).
  34. R. Hippler, M. Čada, Z. Hubička
    Direct current and high power impulse magnetron sputtering discharges with a positively biased anode
    Journal of Vacuum Science & Technology A 39 (2021) 043007(1)-043007(10).
  35. P. Sezemsky, D. Burnat, J. Kratochvil, H. Wulff, A. Kruth, K. Lechowicz, M. Janik, R. Bogdanowicz, M. Čada, Z. Hubička, P. Niedziałkowski, W. Białobrzeska, V. Straňák, M. Smietana
    Tailoring properties of indium tin oxide thin films for their work in both electrochemical and optical label-free sensing systems
    Sensors and Actuators B: Chemical 343 (2021) 130173(1)-130173(11).
  36. R. Hippler, M. Čada, P. Kšírová, J. Olejníček, P. Jiříček, J. Houdková, H. Wulff, A. Kruth, C.A. Helm, Z. Hubička
    Deposition of cobalt oxide films by reactive pulsed magnetron sputtering
    Surface & Coatings Technology 405 (2021) 126590(1)-126590(11).
  37. R. Hippler, M. Čada, Z. Hubička
    Time-resolved diagnostics of a bipolar HiPIMS discharge
    Journal of Applied Physics 127 (2020) 303303(1)-203303(10).
  38. T. Kozák, A. D. Pajdarová, M. Čada, Z. Hubička, P. Mareš, J. Čapek
    Ion energy distributions at substrate in bipolar HiPIMS: effect of positive pulse delay, length and amplitude
    Plasma Sources Science and Technology 29 (2020) 065003(1)-065003(10).
  39. J. Olejníček, J. Šmíd, M. Čada, P. Kšírová, M. Kohout, R. Perekrestov, D. Tvarog, Š. Kment, H. Kmentová, Z. Hubička
    High rate deposition of photoactive TiO2 films by hot hollow cathode
    Surface & Coatings Technology 383 (2020) 125256(1)-125256(10).
  40. A. D. Pajdarová, T. Kozák, Z. Hubička, M. Čada, P. Mareš, J. Čapek
    Plasma parameters in positive voltage pulses of bipolar HiPIMS discharge determined by Langmuir probe with a sub-microsecond time resolution
    Plasma Sources Science and Technology 29 (2020) 085016(1)-085016(11).
  41. R. Hippler, M. Čada, Z. Hubička
    Time-resolved Langmuir probe diagnostics of a bipolar high power impulse magnetron sputtering discharge.
    Applied Physics Letters 116 (2020) 064101(1)-064101(4).
  42. H. Hajihoseini, M. Čada, Z. Hubička, S. Ünaldi, M. A. Raadu, N. Brenning, J. T. Gudmundsson, D. Lundin
    Sideways deposition rate and ionized flux fraction in dc and high power impulse magnetron sputtering.
    Journal of Vacuum Science & Technology A 38 (2020) 033009(1)-033009(11).
  43. Z. Hubička, M. Zlámal, J. Olejníček, D. Tvarog, M. Čada, J. Krýsa
    Semiconducting p-Type Copper Iron Oxide Thin Films Deposited by Hybrid Reactive-HiPIMS + ECWR and Reactive-HiPIMS Magnetron Plasma System
    Coatings 10 (2020) 232(1)-232(14).
  44. Z. Hubička, M. Čada, A. Kapran, J. Olejníček, P. Kšírová, M. Zanáška, P. Adámek, M. Tichý
    Plasma Diagnostics in Reactive High-Power Impulse Magnetron Sputtering System Working in Ar + H2S Gas Mixture
    Coatings 10 (2020) 246(1)-246(17).
  45. H. Hajihoseini, M. Čada, Z. Hubička, S. Ünaldi, M. A. Raadu, N. Brenning, J. T. Gudmundsson, D. Lundin
    The Effect of Magnetic Field Strength and Geometry on the Deposition Rate and Ionized Flux Fraction in the HiPIMS Discharge
    Plasma 2 (2019) 201-221.
  46. K. Jirátová, R. Perekrestov, M. Dvořáková, J. Balabánová, P. Topka, M. Koštejn, J. Olejníček, M. Čada, Z. Hubička, F. Kovanda
    Cobalt Oxide Catalysts in the Form of Thin Films Prepared by Magnetron Sputtering on Stainless-Steel Meshes: Performance in Ethanol Oxidation
    Catalysts 9 (2019) 806-824.
  47. R. Hippler, M. Čada, V, V. Straňák, Z. Hubička
    Time-resolved optical emission spectroscopy of a unipolar and a bipolar pulsed magnetron sputtering discharge in an argon/oxygen gas mixture with a cobalt target
    Plasma Sources Science and Technology 28 (2019) 115020(1)-115020(13).
  48. M. Dvořáková, R. Perekrestov, P. Kšírová, J. Balabánová, K. Jirátová, J. Maixner, P. Topka, J. Rathouský, M. Koštejn, M. Čada, Z. Hubička, F. Kovanda
    Preparation of cobalt oxide catalysts on stainless steel wire mesh by combination of magnetron sputtering and electrochemical deposition
    Catalysis Today 334 (2019) 13-23.
  49. R. Hippler, M. Čada, V. Straňák, Z. Hubička
    Ion formation in an argon and argon-oxygen gas mixture of a magnetron sputtering discharge
    Journal of Physics Communications 3 (2019) 055011(1)-055011(9).
  50. Z. Hubička, M.Zlámal, M. Čada, Š. Kment, J.Krýsa
    Photo-electrochemical stability of copper oxide photocathodes deposited by reactive high power impulse magnetron sputtering
    Catalysis Today 328 (2019) 29-34.