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Nákup nákladných přístrojů pro rok 2019

Čtvrtek, 17.05.2018 13:30

Místo: Přednáškový sál Fyzikálního ústavu AV ČR, Pod Vodárenskou věží 1, Praha 8
Jazyk: anglicky
Pořadatelé: FZÚ AV ČR

Vystoupení navrhovatelů v rámci konkurzu AV ČR pro nákup nákladných přístrojů pro rok 2019 - přístroje s cenou nad 8 mil. Kč bez DPH


1) Ing. Markéta Jarošová, Ph.D. (oddělení 19, sekce 3):
Electron probe microanalyzer for X-ray microanalysis (EPMA)

The object of this application is the replacement of electron probe microanalyzer by a new one due to the ending of the lifetime period of present microanalyzer. EPMA is used for non-destructive elemental analysis and imaging of surfaces of solid materials. The combination of five wavelength dispersive X-ray spectrometers (WDS) and one energy dispersive X-ray spectrometer (EDS) enables quantitative and qualitative analysis of elements from B to U. It is possible to analyse the trace elements, thin layers or light elements because of high spectral resolution of WDS.

2) Oleg Heczko (oddělení 11, sekce 2):
Magnetic Property Measurement System (MPMS3)

The application is motivated by an effort to replace the obsolete device, SQUID magnetometer used for highly sensitive and precise measurements of magnetic properties. The current system originated from the eighties is on the edge of service life, the failure is imminent and only limited repair is available. The new system MPMS3, also using SQUID sensor, provides much higher precision and speed of measurement in both DC and VSM modes in the range of 0.45K up to 1000K. The system is equipped with the fast charging of superconducting magnet (7T) allowing newly the studies of (pseudo)dynamic effects. MPMS3 is an advanced system that fast becomes the standard for magnetic measurements in the 21st century. The device will be part of Joint Laboratory of Magnetic Studies which is shared laboratory of FZU AVCR and MFF UK. There is no such system in the Czech Republic.

3) Ing. Marián Varga, Ph.D. (odd. 27, sekce 3):
Deep Reactive Ion Etching vacuum system

In this presentation, the current state of Reactive Ion Etching systems will be summarized. Basic technological principles and advantages of the Deep Reactive Ion Etching (DRIE) vacuum system for the fabrication of high aspect ratio perpendicular deep etchings will be presented. Benefits of the DRIE system in terms of wide range cross-departmental research activities carried out at the Institute of Physics will be emphasized.

Vystoupení navrhovatelů proběhne v anglickém jazyce. Přednášky budou mít délku 20 minut a po každé z nich bude následovat diskuse v délce max. 10 minut.