Advanced experimental research of plasma discharge sources used for the preparation of nanostructured thin films

In the project we assume research of pulse modulated plasma sources (cylindrical and planar magnetron, plasma nozzle, microwave surfatron discharge), their characterization for the deposition of thin (especially oxide) layers and together with computer simulations to clarify the physical processes of thin film growth and formation. Plasma will be studied in these systems using suitable diagnostic methods and the obtained results will serve as input parameters to the computer simulation model. The main goals of the project are the following: - Optimize pulsed plasma sources for efficient deposition of thin oxide layers: planar magnetron, plasma nozzle with hollow cathode operating at low pressure and surfatron-excited microwave jet discharge operating at higher pressures. - Implement the following advanced diagnostic methods measuring in time with these plasma sources resolution: electrostatic probe, emission and laser absorption spectroscopy, mass spectrometry and measurement energy distribution of ions. - Experimentally characterize the plasma processes taking place in these plasma sources and understand them influence on the properties of applied nanocrystalline thin films, including diagnostics of their crystallographic structure and related properties. - Based on the results of plasma diagnostics and the properties of the deposited layers, create computer simulations of layer growth and explain the basic physical principles responsible for layer formation.