Image
Text
This commercial Microwave Plasma Enhanced Chemical Vapour Deposition system is used for the growth of boron-doped diamond. Both epitaxial and nanocrystalline diamond layers are routinely deposited in this reactor over a wide range of boron concentrations. Boron-doped diamond is mainly studied for its electrical properties. At low boron concentration, it is a p-type semiconductor for the fabrication of high power high voltage electronic devices. At high concentration, it is a superconductor at cryogenic temperature. It is also a chemically stable electrochemical electrode with a wide potential window with potential water treatment, CO2 reduction, and electrochemical sensing applications.