Preparation of materials

PECVD Apparatus Aurion for Deposition of Silicon Materials

Atomic Layer Deposition Apparatus ALD Picosun R-200 Advance

PLD workstation for thin film deposition and laser ablation plume analysis

PLD Station_for FZU report.jpg

System for molecular beam epitaxy, type Octoplus 350

MBE Octoplus 350

Hybrid systems for thin film preparation

Hybridní systémy pro přípravu tenkých vrstev

SPS - Spark Plasma Sintering Furnace

Spark Plasma Sintering Furnace

Apparatus for preparation of semiconductor nitride structures AIXTRON 200-4 RF-S

System for magnetron sputtering, type AJA Orion 8

Laboratoř magnetronového naprašování

Laboratory for organic synthesis and synthesis of nanoparticles

25_Laboratoř_(vakuová sušárna, pumpa, lyofilizátor).jpg

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