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    Damage threshold of LiF crystal irradiated by femtosecond hard XFEL pulse sequence
    Optics Express 31, No 16 (2023) 1-15.
  2. J. Krása, V. Nassisi, T. Burian, V. Hájková, J. Chalupský, Š. Jelínek, K. Frantálová, M. Krupka, Z. Kuglerová, S.K. Singh, V. Vozda, L. Vyšín, J. Wilde, M. Šmíd, P. Perez-Martin, X. Pan, M. Kühlman, J. Pintor, J. Cikhardt, M. Dreimann, D. Eckermann, F. Rosenthal, S.M. Vinko, A. Forte, T. Gawne, T. Campbell, S. Ren, Y.F. Shi, T. Hutchinson, O. Humphries, T. Preston, M. Makita, M. Nakatsutsumi, A. Köhler, M. Harmand, S. Toleikis, K. Falk, L. Juha
    Ion emission from plasmas produced by femtosecond pulses of short-wavelength free-electron laser radiation focused on massive targets: an overview and comparison with long-wavelength laser ablation
    Proc. of SPIE, Vol. 12578, SPIE Optics + Optoelectronics, 2023, Prague, CR, Optics Damage and Materials Processing by EUV/X-ray Radiation (XDam8), (6 June 2023), 125780J(1) - 125780J(9)
  3. X. Pan, M. Šmíd, R. Štefaníková, F. Donat, C. Baehtz, T. Burian, V. Cerantola, L. Gaus, O. S. Humphries, V. Hájková, L. Juha, M. Krupka, M. Kozlová, Z. Konopkova, T. R. Preston, L. Wollenweber, U. Zastrau, K. Falk
    Imaging x-ray spectrometer at the high energy density instrument of the European x-ray free electron laser
    Review of Scientific Instruments 94 (2023) 033501(1)-033501(12).
  4. S. Makarov, M. Makita, M. Nakatsutsumi, T. Pikuz, N. Ozaki, T.R. Preston, K. Appel, Z. Konopková, V. Cerantola, E. Brambrink, J.-P. Schwinkendorf, I. Mohacsi, T. Burian, J. Chalupský, V. Hájková, L. Juha, V. Vozda, B. Nagler, U. Zastrau, S. Pikuz
    Direct LiF imaging diagnostics on refractive X-ray focusing at the EuXFEL High Energy Density instrument
    Journal of Synchrotron Radiation 30 (2023) 1-9.
  5. J. Chalupský, V. Vozda, J. Hering, J. Kybic, T. Burian, S. Dziarzhytski, K. Frantálová, V. Hájková, Š. Jelínek, L. Juha, B. Keitel, Z. Kuglerová, M. Kuhlmann, B. Petryshak, M. Ruitz-Lopez, L. Vyšín, T. Wodzinski, E. Plonjes
    Deep learning for laser beam imprinting
    Optics Express 31, No.12 (2023) 19703-19721.