Plasma system for inner surface coating

A hollow cathode with pulsed bipolar discharge is used to sputter coatings on the inner walls of an object. The coating material is determined by the nozzle and is (reactively) sputtered to create the deposited layer.
This system includes the option of ion scrubbing the surface before deposition and the ability to control ion bombardment of the coated surface during the deposition process.

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Features and benefits

  • Sputtering or reactive sputtering using a hollow cathode in low temperature plasma with defined ion energy
  • High deposition rate
  • No need of external magnetic field

 

  • Coating inner surfaces of hollow structures down to an I.D. of 7 mm
  • More environmentally friendly and cost effective than galvanization
  • High hardness, purity and surface smoothness of deposited films
  • Energy efficient process compared to galvanization
  • Internal surfaces of ferromagnetic tubes, ceramic tubes, etc., can be coated

 

Specification 

  • Deposition of Ti, TiN, Zr, ZrN, Cr, CrN, etc. thin films with wide range of thickness 500 nm–30 micron, minimum inner diameter of coated tube 7 mm
  • Maximum length of coated tube: 400 mm
  • Working gasses: Ar, N2
  • Maximum applied power to the discharge: 150 W maximum set ion energy
  • Bombardment of the substrate surface: 200 eV

 

Applications

There are a wide range of applications, some examples include:

  • Automotive industry
  • Coating industry
  • Semiconductors industry
  • Mechanical engineering industry

 

Technology transfer office | tto [at] fzu [dot] cz
Mrs. Miroslava Pribisova | e-mail: pribisova [at] fzu [dot] cz (pribisova[at]fzu[dot]cz)| mobile: +420 601 386 148

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