1. T. Mates, A. Fejfar, B. Rezek, J. Kočka, P.C. P. Bronsveld, J.K. Rath, R.E.I.Schropp
    C-AFM and X-TEM: Studies of Mixed-Phase Silicon Thin Films.
    Imaging and Microscopy 10 (2008) 30-32.
  2. M. Ledinský, A. Vetuško, J. Stuchlík, T. Mates, A. Fejfar, J. Kočka, J. Štěpánek
    Crystallinity of the mixed phase silicon thin films by Raman spectroscopy.
    Journal of Non-Crystalline Solids 354 (2008) 2253-2257.
  3. J. Kočka, T. Mates, M. Ledinský, T. h. Stuchlíková, J. Stuchlík, A. Fejfar
    A simple tool for quality evaluation of the microcrystalline silicon prepared at high growth rate.
    Thin Solid Films 516 (2008) 4966-4969.
  4. S. Honda, T. Mates, B. Rezek, A. Fejfar, J. Kočka
    Microscopic study of the H2O vapor treatment of the silicon grain boundaries.
    Journal of Non-Crystalline Solids 354 (2008) 2310-2313.
  5. J. Kočka, T. Mates, M. Ledinský, T. h. Stuchlíková, J. Stuchlík, A. Fejfar
    A simple quality factor for characterization of thin silicon films
    Journal of Non-Crystalline Solids 354 (2008) 2227-2230.
  6. A. Vetuško, M. Ledinský, J. Stuchlík, T. Mates, A. Fejfar, J. Kočka
    Mapping of mechanical stress in silicon thin films on silicon cantilevers by Raman microspectroscopy
    Journal of Non-Crystalline Solids 354 (2008) 2235-2237.
  7. B. Rezek, E. Šípek, M. Ledinský, P. Krejza, J. Stuchlík, A. Fejfar, J. Kočka
    Spatially localized current-induced crystallization of amorphous silicon films
    Journal of Non-Crystalline Solids 354 (2008) 2305-2309.
  8. J. Kočka, T. Mates, M. Ledinský, T. h. Stuchlíková, J. Stuchlík, A. Fejfar
    Properties of thin film silicon, prepared at high growth rate in a wide range of thicknesses
    Journal of Non-Crystalline Solids 354 (2008) 2451-2454.