1. S. Honda, T. Mates, K. Knížek, M. Ledinský, A. Fejfar, J. Kočka, T. Yamazaki, Y.Uraoka, T.Fuyuki
    Hydrogenation of polycrystalline silicon thin films
    Thin Solid Films 501 (2006) 144-148.
  2. H.Boldyryeva, S.Honda, A.Macková, T. Mates, A. Fejfar, J. Kočka
    Characterization of hydrogen contained in passivated poly-Si and microcrystalline-Si by ERDA technique
    Surface and Interface Analysis 38, č.4 (2006) 819-822.
  3. J. Kočka, T. Mates, T. h. Stuchlíková, J. Stuchlík, A. Fejfar
    Characterization of grain growth, nature and role of grain boundaries in microcrystalline silicon – review of typical features.
    Thin Solid Films 501 (2006) 107-112.
  4. J. Kočka, T. Mates, M. Ledinský, T. h. Stuchlíková, J. Stuchlík, A. Fejfar
    Transport properties of microcrystalline silicon prepared at high growth rate.
    Journal of Non-Crystalline Solids 352 (2006) 1097-1100.
  5. J. Kočka, T. Mates, M. Ledinský, T. h. Stuchlíková, J. Stuchlík, A. Fejfar
    Microcrystalline silicon prepared at magnetic field modified nucleation
    Journal of Non-Crystalline Solids 352 (2006) 901-905.
  6. M. Ledinský, L. Fekete, J. Stuchlík, T. Mates, A. Fejfar, J. Kočka
    Characterization of mixed phase silicon by Raman spectroscopy
    Journal of Non-Crystalline Solids 352 (2006) 1209-1212.
  7. T. Mates, P.C.P.Bronsveld, A. Fejfar, B. Rezek, J. Kočka, J.K.Rath, R.E.I. Schropp
    Detailed structural study of low temperature mixed-phase Si films by X-TEM and ambient conductive AFM.
    Journal of Non-Crystalline Solids 352 (2006) 1011-1015.
  8. S.Honda, A. Fejfar, J. Kočka, T.Yamazaki, A.Ogane, Y.Uraoka, T.Fuyuki
    Annealing in water vapor as a new method for improvement of silicon thin film properties
    Journal of Non-Crystalline Solids 352 (2006) 955-958.
  9. S.Honda, T. Mates, M. Ledinský, A. Fejfar, J. Kočka, T.Yamazaki, Y.Uraoka, T.Fuyuki, H.Boldyryeva, A.Macková, V.Peřina
    Defects generation by hydrogen passivation of polycrystalline silicon thin films.
    Solar Energy 80 (2006) 653-657.
  10. P.C.P.Bronsveld, J.K.Rath, R.E.Schropp, T. Mates, A. Fejfar, B. Rezek, J. Kočka
    Internal structure of mixed phase hydrogenated silicon thin films made at 39oC
    Applied Physics Letters 89 (2006) 051922-1-051922-3.
  11. L. Fekete, H. Němec, F. Kadlec, P. Kužel, J. Stuchlík, A. Fejfar, J. Kočka
    Carrier dynamics in microcrystalline silicon studied by time-resolved terahertz spectroscopy
    Journal of Non-Crystalline Solids 352 (2006) 2846-2849.