1. D. Lundin, M. Čada, Z. Hubička
    Time-resolved ion flux and impedance measurements for process characterization in reactive high-power impulse magnetron sputtering
    Journal of Vacuum Science & Technology A 34 (2016) 041305(1)-041305(10).
  2. Š. Kment, Z. Hubička, J. Krysa, D. Sekora, M. Zlámal, J. Olejníček, M. Čada, P. Kšírová, Z. Remeš, P. Schmuki, E. Schubert, R. Zbořil
    On the improvement of PEC activity of hematite thin films deposited by high-power pulsed magnetron sputtering method
    Applied Catalysis B: Environmental 165 (2015) 344-350.
  3. D. Lundin, M. Čada, Z. Hubička
    Ionization of sputtered Ti, Al, and C coupled with plasma characterization in HiPIMS
    Plasma Sources Science and Technology 24 (2015) 035018(1)-035018(11).
  4. M. Čada, Z. Hubička, P. Adámek, J. Olejníček, Š. Kment, J. Adámek, J. Stöckel
    A modified Katsumata probe - Ion sensitive probe for measurement in non-magnetized plasmas
    Review of Scientific Instruments 86 (2015) 073510(1)-073510(7).
  5. A. Taylor, P. Ashcheulov, M. Čada, L. Fekete, P. Hubík, L. Klimša, J. Olejníček, Z. Remeš, I. Jirka, P. Janíček, E. Bedel-Pereira, J. Kopeček, J. Mistrík, V. Mortet
    Effect of plasma composition on nanocrystalline diamond layers deposited by a microwave linear antenna plasma-enhanced chemical vapour deposition system
    physica status solidi (a) 212 (2015) 2418-2423.
  6. P. Dytrych, P. Klusoň, O. Šolcová, Š. Kment, V. Straňák, M. Čada, Z. Hubička
    Shape selective photoinduced electrochemical behavior of thin ZnO layers prepared by surfatron
    Thin Solid Films 597 (2015) 131-139.
  7. M. Dvořáková, Z. Hubička, Š. Kment, J. Olejníček, M. Čada, P. Kšírová, J. Krýsa
    Semiconducting WO3 thin films prepared by pulsed reactive magnetron sputtering
    Research on Chemical Intermediates 41 (2015) 9259-9266.
  8. L. Wang, C.Y. Lee, R. Kirchgeorg, N. Liu, K. Lee, Š. Kment, Z. Hubička, J. Krýsa, J. Olejníček, M. Čada, R. Zbořil, P. Schmuki
    Anodic self-organized transparent nanotubular/porous hematite films from Fe thin-films sputtered on FTO and photoelectrochemical water splitting
    Research on Chemical Intermediates 41 (2015) 9333-9341.
  9. Š. Kment, H. Kmentová, Z. Hubička, J. Olejníček, M. Čada, J. Krýsa
    Enhanced photocatalytic activity of silver-doped nanoparticulate TiO2 thin films with respect to the method of doping
    Research on Chemical Intermediates 41 (2015) 9343-9355.
  10. Š. Kment, P. Schmuki, Z. Hubička, L. Machala, R. Kirchgeorg, N. Liu, L. Wang, K. Lee, J. Olejníček, M. Čada, I. Gregora, R. Zbořil
    Photoanodes with Fully Controllable Texture: The Enhanced Water Splitting Efficiency of Thin Hematite Films Exhibiting Solely (110) Crystal Orientation
    ACS Nano 9 (2015) 7113-7123.
  11. V. Straňák, Z. Hubička, M. Čada, S. Drache, M. Tichý, R. Hippler
    Investigation of ionized metal flux in enhanced high power impulse magnetron sputtering discharges
    Journal of Applied Physics 115 (2014) 153301(1)-153301(7).
  12. V. Straňák, H. Wulff, P. Kšírová, C. Zietz, S. Drache, M. Čada, Z. Hubička, R. Bader, M. Tichý, Ch. A. Helm, R. Hippler
    Ionized vapor deposition of antimicrobial Ti–Cu films with controlled copper release
    Thin Solid Films 550 (2014) 389-394.
  13. Tomáš Kubart, M. Čada, Daniel Lundin, Z. Hubička
    Investigation of ionized metal flux fraction in HiPIMS discharges with Ti and Ni targets
    Surface & Coatings Technology 238 (2014) 152-157.
  14. M. Kohout, J. Olejníček, J. Šmíd, M. Čada, Š. Kment, P. Kšírová, M. Dvořáková, Z. Hubička
    ZnO thin films prepared by multi SWD plasma jet system
    Jemná mechanika a optika 59 (2014) 38-42.
  15. J. Olejníček, J. Šmíd, M. Čada, Š. Kment, O. Churpita, P. Kšírová, M. Dvořáková, P. Adámek, M. Kohout, V. Valvoda, D. Chvostová, M. Zlámal, Z. Hubička
    ZnO thin films prepared by surfatron produced discharge
    Catalysis Today 230 (2014) 119-124.
  16. Š. Potocký, O. Babčenko, M. Davydova, T. Izak, M. Čada, A. Kromka
    Growth of carbon allotropes and plasma characterization in linear antenna microwave plasma CVD system
    Japanese Journal of Applied Physics 53 (2014) 05FP04-1-05FP04-3.
  17. J. Olejníček, M. Čada, J. Šmíd, Š. Kment, Z. Hubička
    Multi-SWD Plasma Jet System for PECVD Deposition of Thin Films
    IEEE Transactions on Plasma Science 42 (2014) 2502- 2503.
  18. J. Olejníček, Z. Hubička, M. Kohout, P. Kšírová, Š. Kment, M. Dvořáková, M. Čada, S.A. Darveau, C.L. Exstrom
    High Power Impulse Magnetron Sputtering of CIGS Thin Films for High Efficiency Thin Film Solar Cells
    Plasma Physics and Technology 1 (2014) 135-137.
  19. Š. Kment, Z. Hubička, J. Krysa, J. Olejníček, M. Čada, I. Gregora, M. Zlámal, M. Dvořáková, Z. Remeš, N. Liu, L. Wang, R. Kirchgeorg, Ch.Y. Lee, P. Schmuki
    High-power pulsed plasma deposition of hematite photoanode for PEC water splitting
    Catalysis Today 230 (2014) 8-14.
  20. V. Sushkov, H. T. Do, M. Čada, Z. Hubička, R. Hippler
    Time-resolved tunable diode laser absorption spectroscopy of excited argon and ground-state titanium atoms in pulsed magnetron discharges
    Plasma Sources Science and Technology 22 (2013) 015002(1)-015002(10).
  21. S. Drache, V. Straňák, A-P. Herrendorf, M. Čada, Z. Hubička, M. Tichý, R. Hippler
    Time-resolved Langmuir probe investigation of hybrid high power impulse magnetron sputtering discharges
    Vacuum 90 (2013) 176-181.
  22. V. Straňák, A.-P. Herrendorf, H. Wulff, S. Drache, M. Čada, Z. Hubička, M. Tichý, R. Hippler
    Deposition of rutile (TiO2) with preferred orientation by assisted high power impulse magnetron sputtering
    Surface & Coatings Technology 222 (2013) 112-117.
  23. P. Adámek, J. Olejníček, M. Čada, Š. Kment, Z. Hubička
    Time-resolved tunable diode laser absorption spectroscopy of pulsed plasma
    Optics Letters 38 (2013) 2428-2430.
  24. J. Olejníček, Z. Hubička, P. Kšírová, Š. Kment, M. Dvořáková, M. Kohout, M. Čada, S.A. Darveau, C.L. Exstrom
    Preparation of CIGS Thin Films by HiPIMS or DC Sputtering and Various Selenization Processes
    Journal of Advanced Oxidation Technologies 16 (2013) 314-319.
  25. Š. Potocký, M. Čada, O. Babčenko, T. Ižák, M. Davydova, A. Kromka
    Perspectives of linear antenna microwave system for growth of various carbon nano-forms and its plasma study
    physica status solidi (b) 250 (2013) 2723-2726.
  26. M. Čada, P. Adámek, V. Straňák, Š. Kment, J. Olejníček, Z. Hubička, R. Hippler
    Angle-resolved investigation of ion dynamics in high power impulse magnetron sputtering deposition system
    Thin Solid Films 549 (2013) 177-183.
  27. Z. Hubička, Š. Kment, J. Olejníček, M. Čada, T. Kubart, M. Dvořáková, P. Kšírová, P. Adámek, Z. Remeš
    Deposition of hematite Fe2O3 thin film by DC pulsed magnetron and DC pulsed hollow cathode sputtering system
    Thin Solid Films 549 (2013) 184-191.
  28. J. Olejníček, Z. Hubička, Š. Kment, M. Čada, P. Kšírová, P. Adámek, I. Gregora
    Investigation of reactive HiPIMS + MF sputtering of TiO2 crystalline thin films
    Surface & Coatings Technology 232 (2013) 376-383.
  29. V. Straňák, S. Drache, R. Bogdanowicz, H. Wulff, A-P. Herrendorf, Z. Hubička, M. Čada, M. Tichý, R. Hippler
    Effect of mid-frequency discharge assistance on dual-high power impulse magnetron sputtering
    Surface & Coatings Technology 206 (2012) 2801-2809.
  30. V. Straňák, A.-P. Herrendorf, S. Drache, M. Čada, Z. Hubička, M. Tichý, R. Hippler
    Highly ionized physical vapor deposition plasma source working at very low pressure
    Applied Physics Letters 100 (2012) 141604(1)-141604(3).
  31. V. Straňák, A-P. Herrendorf, S. Drache, M. Čada, Z. Hubička, R. Bogdanowicz, M. Tichy, R. Hippler
    Plasma diagnostics of low pressure high power impulse magnetron sputtering assisted by electron cyclotron wave resonance plasma
    Journal of Applied Physics 112 (2012) 093305(1)-093305(9).
  32. G. Suchaneck, Z. Hubička, M. Čada, D.A. Kiselev, I. Bdikin, A.A. Levin, L. Jastrabík, A.L. Kholkin, G. Gerlach, A. Dejneka
    Imprint Behavior of Piezoelectric PZT Thin Films Deposited onto Cu-Coated Polymer Substrates
    Ferroelectrics 419 (2011) 103-108.
  33. V. Straňák, H. Wulff, R. Bogdanowicz, S. Drache, Z. Hubička, M. Čada, M. Tichý, R. Hippler
    Growth and properties of Ti-Cu films with respect to plasma parameters in dual-magnetron sputtering discharges
    European Physical Journal D 64 (2011) 427-435.
  34. V. Straňák, R. Bogdanowicz, S. Drache, M. Čada, Z. Hubička, R. Hippler
    Dynamic Study of Dual High-Power Impulse Magnetron Sputtering Discharge by Optical Emission Imaging
    IEEE Transactions on Plasma Science 39 (2011) 2454-2455.
  35. V. Straňák, S. Drache, M. Čada, Z. Hubička, M. Tichý, R. Hippler
    Time-Resolved Diagnostics of Dual High Power Impulse Magnetron Sputtering With Pulse Delays of 15 μs and 500 μs
    Contributions to Plasma Physics 51 (2011) 237-245.
  36. M. Čada, Z. Hubička, P. Adámek, J. Klusoň, L. Jastrabík
    Time-resolved plasma parameters in the HiPIMS discharge with Ti target in Ar/O2 atmosphere
    Surface & Coatings Technology 205 (2011) S317-S322.
  37. Š. Kment, Z. Hubička, H. Kmentová, P. Klusoň, J. Krýsa, I. Gregora, M. Morozová, M. Čada, D. Petraš, P. Dytrych, M. Slater, L. Jastrabík
    Photoelectrochemical properties of hierarchical nanocomposite structure: Carbon nanofibers/TiO2/ZnO thin films
    Catalysis Today 161 (2011) 8-14.
  38. P. Virostko, Z. Hubička, M. Čada, M. Tichý
    Ion current to a substrate in the pulsed dc hollow cathode plasma jet deposition system
    Journal of Physics D: Applied Physics 43 (2010) 124019(1)-124019(7).
  39. V. Straňák, M. Čada, Z. Hubička, M. Tichý, R. Hippler
    Time-resolved investigation of dual high power impulse magnetron sputtering with closed magnetic field during deposition of Ti–Cu thin films
    Journal of Applied Physics 108 (2010) 043305(1)-043305(8).
  40. Š. Kment, P. Kluson, Z. Hubička, J. Krysa, M. Čada, I. Gregora, A. Dejneka, Z. Remeš, H. Zabova, L. Jastrabík
    Double hollow cathode plasma jet-low temperature method for the TiO2-xNx photoresponding films
    Electrochimica Acta 55 (2010) 1548-1556.
  41. M. Čada, P. Virostko, Š. Kment, Z. Hubička
    Measurement of total energy flux density at a substrate during TiOx thin film deposition by using a plasma jet system
    Vacuum 83 (2009) 738-744.
  42. M. Tichý, Z. Hubička, M. Šícha, M. Čada, J. Olejníček, O. Churpita, L. Jastrabík, P. Virostko, P. Adámek, P. Kudrna, S. Leshkov, M. Chichina, Š. Kment
    Langmuir probe diagnostics of a plasma jet system
    Plasma Sources Science and Technology 18 (2009) 014009(1)-014009(11).
  43. Š. Kment, P. Klusoň, V. Straňák, P. Virostko, J. Krýsa, M. Čada, J. Prachařová, M. Kohout, M. Morozová, P. Adámek, Z. Hubička
    Photo-induced electrochemical functionality of the TiO2 nanoscale films
    Electrochimica Acta 54 (2009) 3352-3359
  44. J. Olejníček, Z. Hubička, M. Čada, P. Virostko, Š. Kment, P. Adámek, L. Jastrabík, A. Dejneka
    Space resolved optical emission spectroscopy during deposition of BaxSr1-xTiO3 thin films by double hollow cathode plasma Jet system
    Materials Science Forum 609 (2009) 105-109.
  45. V. Straňák, M. Čada, M. Quaas, S. Block, R. Bogdanowicz, Š. Kment, H. Wulff, Z. Hubička, Ch. A. Helm, M. Tichý, R. Hippler
    Physical properties of homogeneous TiO2 films prepared by high power impulse magnetron sputtering as a function of crystallographic phase and nanostructure
    Journal of Physics D: Applied Physics 42 (2009) 105204(1)-105204(12).
  46. Š. Kment, P. Klusoň, H. Žabová, A. Churpita, M. Chichina, M. Čada, I. Gregora, J. Krýsa, Z. Hubička
    Atmospheric pressure barrier torch discharge and its optimization for flexible deposition of TiO2 thin coatings on various surfaces
    Surface & Coatings Technology 204 (2009) 667-675.
  47. M. Čada, P. Virostko, Š. Kment, Z. Hubička
    Comparative Study of Total Power Density at a Substrate in Pulsed DC Magnetron and Hollow-Cathode Plasma Jet Sputtering Systems
    Plasma Processes and Polymers 6 (2009) S247-S252.
  48. Š. Kment, P. Klusoň, H. Bartková, J. Krýsa, O. Churpita, M. Čada, P. Virostko, M. Kohout, Z. Hubička
    Advanced methods for titanium (IV) oxide thin functional coatings
    Surface & Coatings Technology 202 (2008) 2379-2383.
  49. P. Virostko, Z. Hubička, M. Čada, P. Adámek, Š. Kment, M. Tichý, L. Jastrabík
    Electrical Probe Diagnostics of the Hollow Cathode Plasma Jet System for Deposition of TiOx Thin Films
    Contributions to Plasma Physics 48 (2008) 527-533.
  50. Z. Hubička, P. Virostko, M. Tichý, M. Čada, P. Adámek, J. Olejníček, A. Dejneka, O. Churpita, V. Valvoda, L. Jastrabík
    Deposition of BaxSr1−xTiO3 thin Films by Double RF Hollow Cathode Plasma Jet System
    Contributions to Plasma Physics 48 (2008) 515-520.