1. X. Li, I. Venkrbcová, D. Lundin, M. Čada, Z. Hubička
    Plasma characterization for the reactive HiPIMS process regulation of vanadium oxides
    Plasma Sources Science and Technology 35 (2026) 035003(1)-035003(16).
  2. A. Písaříková, J. Olejníček, I. Venkrbcová, L. Nožka, S. Cichoň, A. Azinfar, R. Hippler, C. A. Helm, M. Mašláň, L. Machala, Z. Hubička
    CuFeO2 prepared by electron cyclotron wave resonance-assisted reactive HiPIMS with two magnetrons and radio frequency magnetron sputtering
    Journal of Vacuum Science & Technology A 41 (2023) 063005(1)-063005(13).