Investigator
- J. Šmíd
- Ing. Štěpán Kment, Ph.D.
Laboratory / Department
Patent number
Patent 306980
Date of award
Postscript
(2017) -.
A method of controlling the rate of deposition of thin layers in a vacuum multi-nozzle plasma system and a device for implementing this method
Postscript
(2017) -.