Furnace for crystal growth by floating zone melting technique with optical source (FZ-T-12000-X-VP-CR, Crystal Systems, Ltd.)

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Facility enables to prepare single crystals as well as defined crystal conglomerates (bicrystals, tricrystals…) by floating zone melting technique. Optical heating is realized by 4 xenon lamps, each of max. 3 kW. The growth is performed in a space closed with quartz tube in an inert atmosphere or in vacuum. Principally, it is possible to reach temperatures up to 2600°C. Facility has been used for production of single crystals and bicrystals of nickel and alloys on basis of iron and other complex materials.