Fully-PC controlled high-growth rate microwave plasma system dedicated for deposition of intrinsic diamond thin films of optical grade with (without) incorporated optical centres (silicon, nitrogen, others). The microwave plasma system is operated in vacuum chamber at pressures 50-250 mbar and temperatures ranging from 400 to 1200°C. Properties of diamond thin films are tailored for multidisciplinary uses in tribology, microelectronics, sensorics, photonic and optics or biotechnologies (e.g. fabrication of gas sensors, biosensors, FET transistors, MEMS and microfluidic elements, photonic crystals, functional electrodes for electrochemistry, substrates for regenerative medicine, etc.).
Focused Microwave Plasma Enhanced Chemical Vapour Deposition System