Computer control in automatic, semiautomatic or manual operation regime ensure stable low- to high-power density plasmas (pressure range 10-200 Torr) and long deposition processes for thick diamond film growth with possibility of remote monitoring. Enclosed IR pyrometer enables in-situ monitoring of process temperature in range 475-1475 °C while additional slots allow connection of supplementary metrology tools. System is dedicated for deposition of intrinsic and doped diamond films multidisciplinary uses in tribology, microelectronics, sensorics, photonic and optics or biotechnologies (e.g. fabrication of gas sensors, biosensors, FET transistors, MEMS and microfluidic elements, photonic crystals, functional electrodes for electrochemistry, substrates for regenerative medicine, etc.).