Research and development of novel pulsed plasma technologies for deposition of advanced thin-film materials


The aim of the project is to develop and implement into production practice the most advanced, only very recently published technologies based on the HiPIMS method. Specifically, it is the rapid reactive HiPIMS deposition of oxide layers for sensors, the deposition of hard abrasion-resistant layers on non-conductive substrates and the implementation of combined HiPIMS technology with arc evaporation.