In this work, the conditions of non-thermal ultrafast laser annealing have been analyzed for two kinds of nanostructures: amorphous anodic TiO2 nanotube layers and Ge/Si multilayer stacks.
For both cases, regimes of crystallization have been found, which yield in preserving the initial nanomaterial morphologies without any melting signs. Ultrafast non-thermal mechanisms of structural material transformation are suggested, which can provide new opportunities for conversion of amorphous semiconductor nanomaterials into a desired crystalline form that is of high demand for existing and emerging technologies.