Non-thermal regimes of laser annealing of semiconductor nanostructures: crystallization without melting

Perex

In this work, the conditions of non-thermal ultrafast laser annealing have been analyzed for two kinds of nanostructures: amorphous anodic TiO2 nanotube layers and Ge/Si multilayer stacks. 

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For both cases, regimes of crystallization have been found, which yield in preserving the initial nanomaterial morphologies without any melting signs. Ultrafast non-thermal mechanisms of structural material transformation are suggested, which can provide new opportunities for conversion of amorphous semiconductor nanomaterials into a desired crystalline form that is of high demand for existing and emerging technologies.

(a) Schematics of a stress/shock wave initiation upon ultrashort laser annealing of the titania nanotubes. (b) A sketch for phase transformation from the amorphous state to anatase and rutile. (c) SEM image of the TiO2 nanotubes annealed with the picosecond laser pulses.
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(a) Schematics of a stress/shock wave initiation upon ultrashort laser annealing of the titania nanotubes. (b) A sketch for phase transformation from the amorphous state to anatase and rutile. (c) SEM image of the TiO2 nanotubes annealed with the picosecond laser pulses.