Minimal Fab "Design" of the plasma enhanced atomic layer deposition system (Minimal Fab ALD)

The objective of proposed project is development of the ALD system that will suit the concept of Minimal Fab (according to the Minimal Fab Promotion Organization-MFPO). Project activities will be focused on design, fluid-dynamic modelling and construction of PEALD prototype for the deposition on ½ "substrates, which would be compatible with the concept. The proposed system will be able to use different sources of low-temperature plasma, depending on the requirements for the specific ALD process. Process chamber will be equipped with height adjustable sample holder heatable up to 550 °C. The final gas panel will use developed miniature components of the main Japanese partner (company Horiba) because of the very limited space for installation in devices with the concept of Minimal Fab.