Name Provider and programme Investigator from FZU Datum zahájení Datum ukončení
High entropy disulfides: a new class of 2D materials (SHIELD) running GACR » Standard 1. 1. 2025 31. 12. 2027
Thin-film tensometric sensors with high sensitivity and durability prepared by magnetron sputtering (Senzor) running TACR » TREND 1. 3. 2023 30. 6. 2026
Transmission optical elements for securing banknotes and documents using selective deposition of a thin-film structure MPO » Ostatní 1. 1. 2022 30. 6. 2023
Innovative plasma-chemical and chemical synthesis of nickel-containing mixed oxide catalysts for the oxidation of volatile organic pollutants GACR » Standard 1. 1. 2021 31. 12. 2023
Minimal Fab "Design" of the plasma enhanced atomic layer deposition system (Minimal Fab ALD) TACR » DELTA 2 1. 1. 2020 30. 6. 2022
Advanced diagnostics of reactive HiPIMS plasma for deposition of oxide, nitride and sulphide layers GACR » Standard 1. 1. 2019 31. 12. 2021
Research and development of novel pulsed plasma technologies for deposition of advanced thin-film materials MPO » TRIO 1. 1. 2018 31. 12. 2021
Advanced preparation of catalytically active oxides on metal supports using plasma deposition and chemical methods GACR » Standard 1. 1. 2017 31. 12. 2019
Planar optical structures and security elements based on multilayer systems MPO » TRIO 1. 6. 2017 31. 12. 2021
Research of systems with photocathode and photoanode for solar water decomposition (GACR) GACR » Standard 1. 1. 2017 31. 12. 2019
Research and development of a new plasma activated ALD deposition system with a unique source of low-temperature plasma based on a microwave surfatron and ECWR discharge. TACR » DELTA 1. 11. 2016 31. 10. 2019
Research and development of advanced PVD/PECVD low-temperature plasma system for deposition of functional thin and thick TiO2 films for industrial applications TACR » DELTA 1. 3. 2015 28. 2. 2018