Group of plasma deposition of thin films

Our group focuses on both fundamental and applied research in the preparation of thin films and multilayer structures using advanced plasma-based technologies, particularly physical vapor deposition (PVD) and plasma-enhanced chemical vapor deposition (PECVD). Our core technologies include reactive magnetron sputtering, hollow cathode discharge (HCD), and high-power impulse magnetron sputtering (HiPIMS). These methods enable us to achieve precise control over the properties of deposited layers.

We specialize in the development of semiconducting oxides, such as TiO₂, ZnO, and WO₃, which are utilized in areas like photocatalysis, optical coatings, and radiation detection. Additionally, we focus on the preparation of nitrides, sulfides, and metallic layers with potential applications in optoelectronics and environmental technologies. Our research also encompasses hierarchical and nanostructured thin films, where high deposition rates and enhanced crystallinity allow us to optimize their optical and electronic properties.