Plasmatic deposition of thin films

The group is focused on research and development of plasma deposition techniques for preparation of various types of thin films,
multilayer structures and nanostructures. These involved advanced PVD and PECVD plasma methods such as the multi plasma-jet
hollow cathode system for fast reactive sputtering, pulsed reactive HiPIMS magnetron systems and the microwave multi-jet
PECVD plasma system. The main subject of our interest are thin films based on semiconducting oxides (Fe₂O₃, TiO₂, WO₃)
and semiconducting sulphides (FeS₂, MoS₂, etc.) intended for photocatalytic applications (solar decomposition of water, etc.).

The leader of this group is RNDr. Jiří Olejníček, Ph.D.