Verified technology: High-speed deposition of homogeneous oxide films through multi-jet hollow cathode system

Authors

J. Olejníček, J. Šmíd, Z. Hubička, M. Čada

Laboratory / Department
Department of Low-Temperature Plasma
Year
2018

New technological plasma process enabling high-speed deposition of homogeneous oxide films  e.g. TiO2 on industrial substrates such as  plastic foils and the like. The technology itself is based on a hot hollow cathode discharge burning in the  "hollow cathode arc" (HCA) mode, which simultaneously sputters and evaporates the material from which the hollow cathode is made. Compared to classical methods of magnetron sputtering, this method of deposition of thin films achieves up to an order of magnitude higher deposition rate, both because of the absence of oxidation of the sprayed target and partly because of the significant positive effect of thermal evaporation.

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Figure: Linear hollow cathode multi plasma jet system for fast deposition of oxide thin films.