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  1. Home
  2. Research
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  4. Division of Optics
  5. Department of Low-Temperature Plasma
  6. Group of research of low-temperature plasma applied for the deposition of thin films
  7. Equipment

Group of research of low-temperature plasma applied for the deposition of thin films

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Complex measuring system of low temperature plasma diagnostics applied in technological processes with the possibility of measurement with time resolution

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Hybrid reactive pulse HiPIMS + ECWR deposition system for deposition of semiconducting thin films

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Linear plasma system with a series of hollow cathodes for rapid reactive thin film deposition

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Plasma system for ALD deposition of ultrathin layers.

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