Nano-fabrication clean room laboratory hosts an e-beam lithography unit (Raith e-Line) and a complete chain of sample processing technologies. This includes plasma etching system (Oxford Instruments Plasmalab 100, Diener Electronics FEMTO), set of flow boxes and boxes for chemical etching, metal evaporation and sputtering systems (Angstrom Covap, Leybold-Heraeus) and a UV light mask aligner (Elektromat JUB2) for auxiliary optical lithography.