System for molecular beam epitaxy, type Octoplus 400

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Molecular beam epitaxy system equipped with two interconnected growth chambers and one UHV chamber for deposition by vacuum evaporation. The system is designed for the growth of high-quality ultraclean quantum heterostructures based on semiconductors of the III-V family, in particular GaAs/AlGaAs/InGaAs, and other semiconducting, semi-metallic, and metallic materials for spintronics.