System for molecular beam epitaxy, type Octoplus 400


Molecular beam epitaxy system equipped with two interconnected growth chambers and one UHV chamber for deposition by vacuum evaporation. The system is designed for the growth of high-quality ultraclean quantum heterostructures based on semiconductors of the III-V family, in particular GaAs/AlGaAs/InGaAs, and other semiconducting, semi-metallic, and metallic materials for spintronics.