| AFM Bruker Dimension Icon, AFM Veeco Dimension IV |
user access |
Characterisation and testing |
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| Apparatus for preparation of semiconductor nitride structures AIXTRON 200-4 RF-S |
user access |
Nanofabrication |
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| Atomic force microscope NTEGRA Prima |
contract access |
Scanning probe microscopy |
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| Capacitance and impedance measurements |
contract access |
Electrical characterisation |
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| Focused Microwave Plasma Enhanced Chemical Vapour Deposition System |
closed |
Preparation of materials |
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| Fourier-transform Infrared Spectrophotometer (FTIR) |
user access |
Characterisation and testing |
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| Hall effect and resistivity system |
contract access |
Electrical characterisation |
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| Laboratorní pec LAC typ LV15/13MT |
user access |
Materials processing |
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| Laminar flow hood (Flowbox) |
user access |
Preparation of materials |
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| Linear Antenna Microwave Plasma Enhanced Chemical Vapour Deposition System |
closed |
Preparation of materials |
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| MOVPE apparatus AIXTRON CCS 3×2 FT for growth of nitride semiconductors |
user access |
Nanofabrication |
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| Physical vapour deposition system |
contract access |
Thin films and coatings |
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