Growth of intrinsic and boron doped nano- / micro-crystalline or porous diamond thin films, carbon nanotubes and carbon nanosheets on large areas at low pressures and low temperatures (> 250 °C). The fully automated system consists of resistively heated substrate holder up to 750 °C and dual-plasma configuration. This system is fully compatible with commercial systems and dedicated for multidisciplinary uses in tribology, microelectronics, sensorics, photonic and optics or biotechnologies (e.g. fabrication of gas sensors, biosensors, FET transistors, MEMS and microfluidic elements, photonic crystals, functional electrodes for electrochemistry, substrates for regenerative medicine, etc.).
Linear Antenna Microwave Plasma Enhanced Chemical Vapour Deposition System