This novel type of Microwave Plasma Enhanced Chemical Vapour Deposition system has been developed for thin film deposition over large areas (currently ca. 300 cm2) thanks to the use of linear antennas. This fundamental difference with other conventional resonance cavity Microwave Plasma Enhanced Chemical Vapour Deposition systems allows homogeneous coatings at low pressure (< 1 mbar), temperatures as low as 150°C and on 3 dimensional objects thanks to the diffuse nature of the plasma. This versatile deposition system can deposit different hard materials, such as intrinsic diamond, boron-doped diamond, silicon carbide and diamond/silicon carbide composites on various substrates (plastic, metals, glass, quartz, etc.). Silicon carbide and diamond/silicon carbide composite layers with mechanical properties comparable to that of diamond layers but with higher higher adhesion, large area transparent and conductive boron-doped diamond electrodes, and large area thick porous boron-doped electrochemical electrodes are few examples of the capabilities of this coating system.