RNDr. Jiří Olejníček, Ph.D.

I am engaged in both fundamental and applied research, focusing on plasma-assisted preparation of thin films and multilayer structures. I specialize particularly in magnetron sputtering and deposition technologies utilizing hollow cathode discharge. My current research interests include sensor layers for various detectors (e.g., ZnO, Ce:YAG, TiO₂, WO₃), protective and wear-resistant coatings (CrN), and absorption layers for thin-film solar cells (CIXS). I have also been collaborating long-term with industrial partners on the preparation of thin optical films for security elements (TiO₂, Ta₂O₅) and on the development and optimization of high-speed deposition technologies.