Research and development of advanced PVD/PECVD low-temperature plasma system for deposition of functional thin and thick TiO2 films for industrial applications


The main aim of the project is the design, development and implementation of modular hybrid PVD-PECVD deposition system for low-temperature deposition of functional thin and thick films. The system will be based on multi-jet technology of pulsed hollow cathodes and will enable a fast deposition of homogenous functional films on thermally sensitive substrates with the sizes suitable for industrial application. Main project direction will be focused on TiO2 films (with high application potential for photoelectrochemical water-splitting, applied nanostructured optics, diffraction elements for forgery protection. Compared to existing technology, high deposition rate and high level of adjustability of key parameters of deposited films will be achieved.