1. A. Písaříková, H. Krýsova, A. Kapran, P. Písařík, M. Čada, J. Olejníček, R. Hippler, Z. Hubička
    Semiconductor WO3 thin films deposited by pulsed reactive magnetron sputtering
    Materials Science in Semiconductor Processing 186 (2025) 109034(1)-109034(11).
  2. A. Kapran, R. Hippler, H. Wulff, J. Olejníček, L. Volfová, A. Písaříková, N. Nepomniashchaia, M. Čada, Z. Hubička
    Crystalline Structure and Optical Properties of Cobalt Nickel Oxide Thin Films Deposited with a Pulsed Hollow-Cathode Discharge in an Ar+O2 Gas Mixture
    Coatings 14 (2024) 319(1)-319(10).
  3. M. Cadatal-Raduban, J. Olejníček, K. Hibino, Y. Maruyama, A. Písaříková, K. Shinohara, T. Asaka, L. Lebedová Volfová, M. Kohout, Z. Jiaqi, Y. Akabe, M. Nakajima, J.A. Harrison, R. Hippler, N. Sarukura, S. Ono, Z. Hubička, K. Yamanoi
    Ultrafast UV Luminescence of ZnO Films: Sub-30 ps Decay Time with Suppressed Visible Component
    Advanced Optical Materials 12 (2024) 2400377(1)-2400377(12).
  4. R. Hippler, M. Čada, A. Knížek, M. Ferus, Z. Hubička
    A Pulsed Hollow Cathode Discharge Operated in an Ar/N2/O2 Gas Mixture and the Formation of Nitric Oxide
    Plasma Chemistry and Plasma Processing 44 (2024) 1053-1068.
  5. R. Hippler, M. Čada, Z. Hubička
    Energy distribution of negatively and positively charged ions in a magnetron sputtering discharge with a tungsten cathode and a positively biased anode in an argon/oxygen gas mixture
    Plasma Sources Science and Technology 33 (2024) 115006(1)-115006(12).
  6. R. Hippler, M. Čada, A. Knížek, M. Ferus, Z. Hubička
    Generation of Ammonia in a Pulsed Hollow Cathode Discharge Operated in an Ar/H2/N2 Gas Mixture Detected by Fourier Transform Infrared
    ACS Sustainable Chemistry & Engineering 12 (2024) 17443-17449.
  7. R. Hippler, M. Čada, A. Mutzke, Z. Hubička
    Pulse length dependence of a reactive high power impulse magnetron (HiPIMS) discharge
    Plasma Sources Science and Technology 32 (2023) 055013(1)-055013(12).
  8. P. Čurda, R. Hippler, M. Čada, O. Kylián, V. Straňák, Z, Z. Hubička
    The role of dimers in the efficient growth of nanoparticles
    Surface & Coatings Technology 473 (2023) 130045(1)-130045(9).
  9. A. Kapran, R. Hippler, H. Wulff, J. Olejníček, A. Písaříková, M. Čada, Z. Hubička
    Characteristics of a pulsed hollow cathode discharge operated in an Ar+O2 gas mixture and deposition of copper nickel oxide thin films
    Vacuum 215 (2023) 112272(1)-112272(11).
  10. A. Písaříková, J. Olejníček, I. Venkrbcová, L. Nožka, S. Cichoň, A. Azinfar, R. Hippler, C. A. Helm, M. Mašláň, L. Machala, Z. Hubička
    CuFeO2 prepared by electron cyclotron wave resonance-assisted reactive HiPIMS with two magnetrons and radio frequency magnetron sputtering
    Journal of Vacuum Science & Technology A 41 (2023) 063005(1)-063005(13).
  11. A. Písaříková, R. Hippler, H. Wulff, M. Čada, J. Olejníček, N. Nepomniashchaia, C. A. Helm, Z. Hubička
    Deposition of tungsten oxide films by reactive magnetron sputtering on different substrates.
    Journal of Vacuum Science & Technology A 40 (2022) 063402(1)-063402(7).
  12. R. Hippler, M. Čada, Z. Hubička
    Ion energy distribution of plasma ions of a hollow cathode discharge in Ar + N2 and Ar + O2 gas mixtures
    European Physical Journal D 76 (2022) 214(1)-214(7).
  13. A. Písaříková, R. Hippler, H. Wulff, M. Čada, O. Gedeon, P. Jiříček, J. Houdková, J. Olejníček, N. Nepomniashchaia, C. A. Helm, Z. Hubička
    Copper tungsten oxide (CuxWOy) thin films for optical and photoelectrochemical applications deposited by reactive high power impulse magnetron co-sputtering
    Journal of Applied Physics 132 (2022) 215301(1)-215301(13).
  14. J. Olejníček, A. Písaříková, L. Lebedová Volfová, M. Dvořáková, M. Kohout, D. Tvarog, O. Gedeon, H. Wulff, R. Hippler, Z. Hubička
    WO3 and WO3-x thin films prepared by DC hollow cathode discharge
    Vacuum 195 (2022) 110679(1)-110679(10).
  15. R. Hippler, M. Čada, Z. Hubička
    A positively biased external anode for energy control of plasma ions: hollow cathode and magnetron sputtering discharge.
    Plasma Sources Science and Technology 30 (2021) 045003(1)-045003(15).
  16. A. K. Mukhopadhyay, A. Roy, G. Bhattacharjee, S. Ch. Das, A. Majumdar, H. Wulff, R. Hippler
    Surface Stoichiometry and Depth Profile of Tix-CuyNz Thin Films Deposited by Magnetron Sputtering
    Materials 14 (2021) 3191-3191(14).
  17. R. Hippler, M. Čada, Z. Hubička
    Direct current and high power impulse magnetron sputtering discharges with a positively biased anode
    Journal of Vacuum Science & Technology A 39 (2021) 043007(1)-043007(10).
  18. R. Hippler, M. Čada, P. Kšírová, J. Olejníček, P. Jiříček, J. Houdková, H. Wulff, A. Kruth, C.A. Helm, Z. Hubička
    Deposition of cobalt oxide films by reactive pulsed magnetron sputtering
    Surface & Coatings Technology 405 (2021) 126590(1)-126590(11).
  19. R. Hippler, M. Čada, Z. Hubička
    Time-resolved Langmuir probe diagnostics of a bipolar high power impulse magnetron sputtering discharge.
    Applied Physics Letters 116 (2020) 064101(1)-064101(4).
  20. R. Hippler, M. Čada, Z. Hubička
    Time-resolved diagnostics of a bipolar HiPIMS discharge
    Journal of Applied Physics 127 (2020) 303303(1)-203303(10).
  21. R. Hippler, M. Čada, V. Straňák, Z. Hubička
    Ion formation in an argon and argon-oxygen gas mixture of a magnetron sputtering discharge
    Journal of Physics Communications 3 (2019) 055011(1)-055011(9).
  22. R. Hippler, M. Čada, V. Straňák, C. A. Helm, Z. Hubička
    Pressure dependence of singly and doubly charged ion formation in a HiPIMS discharge
    Journal of Applied Physics 125 (2019) 013301(1)-013301(7).
  23. R. Hippler, M. Čada, V, V. Straňák, Z. Hubička
    Time-resolved optical emission spectroscopy of a unipolar and a bipolar pulsed magnetron sputtering discharge in an argon/oxygen gas mixture with a cobalt target
    Plasma Sources Science and Technology 28 (2019) 115020(1)-115020(13).
  24. Petr Sezemský, V. Straňák, Jiří Kratochvíl, M. Čada, R. Hippler, Miroslav Hrabovský, Z. Hubička
    Modified high frequency probe approach for diagnostics of highly reactive plasma
    Plasma Sources Science and Technology 28 (2019) 115009(1)-115009(10).
  25. V. Straňák, Z. Hubička, M. Čada, R. Bogdanowicz, H. Wulff, C. A. Helm, R. Hippler
    Influence of reactive oxygen species during deposition of iron oxide films by high power impulse magnetron sputtering
    Journal of Physics D: Applied Physics 51 (2018) 095205(1)-095205(12).
  26. R. Hippler, Z. Hubička, M. Čada, P. Kšírová, H. Wulff, C. A. Helm, V. Straňák
    Angular dependence of plasma parameters and film properties during high power impulse magnetron sputtering for deposition of Ti and TiO2 layers
    Journal of Applied Physics 121 (2017) 171906(1)-171906(9).
  27. R. Hippler, M. Čada, V. Straňák, Z. Hubička, C.A. Helm
    Pressure dependence of Ar2+, ArTi+, and Ti2+ dimer formation in a magnetron sputtering discharge
    Journal of Physics D: Applied Physics 50 (2017) 445205(1)-445205(8).
  28. J. Alami, V. Straňák, A.P. Herrendorf, Z. Hubička, R. Hippler
    Design of magnetic field configuration for controlled discharge properties in highly ionized plasma.
    Plasma Sources Science and Technology 24 (2015) 045016(1)-045016(10).
  29. V. Straňák, S. Drache, H. Wulff, Z. Hubička, M. Tichý, A. Kruth, Ch. A. Helm, R. Hippler
    Oxidation behavior of Cu nanoparticles embedded into semiconductive TiO2 matrix.
    Thin Solid Films 589 (2015) 864-871.
  30. V. Straňák, Z. Hubička, M. Čada, S. Drache, M. Tichý, R. Hippler
    Investigation of ionized metal flux in enhanced high power impulse magnetron sputtering discharges
    Journal of Applied Physics 115 (2014) 153301(1)-153301(7).
  31. S Drache, V. Straňák, F. Berg, Z. Hubička, M. Tichý, Ch. A. Helm, R. Hippler
    Pulsed gas aggregation for improved nanocluster growth and flux
    physica status solidi (a) 211 (2014) 1189-1193.
  32. S. Drache, V. Straňák, Z. Hubička, F. Berg, M. Tichy, Ch. A. Helm, R. Hippler
    Study of mass and cluster flux in a pulsed gas system with enhanced nanoparticle aggregation.
    Journal of Applied Physics 116 (2014) 143303(1)-143303(8).
  33. V. Straňák, H. Wulff, P. Kšírová, C. Zietz, S. Drache, M. Čada, Z. Hubička, R. Bader, M. Tichý, Ch. A. Helm, R. Hippler
    Ionized vapor deposition of antimicrobial Ti–Cu films with controlled copper release
    Thin Solid Films 550 (2014) 389-394.
  34. M. Čada, P. Adámek, V. Straňák, Š. Kment, J. Olejníček, Z. Hubička, R. Hippler
    Angle-resolved investigation of ion dynamics in high power impulse magnetron sputtering deposition system
    Thin Solid Films 549 (2013) 177-183.
  35. V. Sushkov, H. T. Do, M. Čada, Z. Hubička, R. Hippler
    Time-resolved tunable diode laser absorption spectroscopy of excited argon and ground-state titanium atoms in pulsed magnetron discharges
    Plasma Sources Science and Technology 22 (2013) 015002(1)-015002(10).
  36. S. Drache, V. Straňák, A-P. Herrendorf, M. Čada, Z. Hubička, M. Tichý, R. Hippler
    Time-resolved Langmuir probe investigation of hybrid high power impulse magnetron sputtering discharges
    Vacuum 90 (2013) 176-181.
  37. V. Straňák, A.-P. Herrendorf, H. Wulff, S. Drache, M. Čada, Z. Hubička, M. Tichý, R. Hippler
    Deposition of rutile (TiO2) with preferred orientation by assisted high power impulse magnetron sputtering
    Surface & Coatings Technology 222 (2013) 112-117.
  38. V. Straňák, A.-P. Herrendorf, S. Drache, M. Čada, Z. Hubička, M. Tichý, R. Hippler
    Highly ionized physical vapor deposition plasma source working at very low pressure
    Applied Physics Letters 100 (2012) 141604(1)-141604(3).
  39. V. Straňák, S. Drache, R. Bogdanowicz, H. Wulff, A-P. Herrendorf, Z. Hubička, M. Čada, M. Tichý, R. Hippler
    Effect of mid-frequency discharge assistance on dual-high power impulse magnetron sputtering
    Surface & Coatings Technology 206 (2012) 2801-2809.
  40. V. Straňák, A-P. Herrendorf, S. Drache, M. Čada, Z. Hubička, R. Bogdanowicz, M. Tichy, R. Hippler
    Plasma diagnostics of low pressure high power impulse magnetron sputtering assisted by electron cyclotron wave resonance plasma
    Journal of Applied Physics 112 (2012) 093305(1)-093305(9).
  41. V. Straňák, S. Drache, M. Čada, Z. Hubička, M. Tichý, R. Hippler
    Time-Resolved Diagnostics of Dual High Power Impulse Magnetron Sputtering With Pulse Delays of 15 μs and 500 μs
    Contributions to Plasma Physics 51 (2011) 237-245.
  42. V. Straňák, S. Block, S. Drache, Z. Hubička, C. A. Helm, L. Jastrabík, M. Tichý, R. Hippler
    Size-controlled formation of Cu nanoclusters in pulsed magnetron sputtering system
    Surface & Coatings Technology 205 (2011) 2755-2762.
  43. V. Straňák, H. Wulff, R. Bogdanowicz, S. Drache, Z. Hubička, M. Čada, M. Tichý, R. Hippler
    Growth and properties of Ti-Cu films with respect to plasma parameters in dual-magnetron sputtering discharges
    European Physical Journal D 64 (2011) 427-435.
  44. V. Straňák, R. Bogdanowicz, S. Drache, M. Čada, Z. Hubička, R. Hippler
    Dynamic Study of Dual High-Power Impulse Magnetron Sputtering Discharge by Optical Emission Imaging
    IEEE Transactions on Plasma Science 39 (2011) 2454-2455.
  45. V. Straňák, M. Quaas, R. Bogdanowicz, H. Steffen, H. Wulff, Z. Hubička, M. Tichý, R. Hippler
    Effect of nitrogen doping on TiOxNy thin film formation at reactive high-power pulsed magnetron sputtering
    Journal of Physics D: Applied Physics 43 (2010) 285203(1)-285203(7).
  46. V. Straňák, M. Čada, Z. Hubička, M. Tichý, R. Hippler
    Time-resolved investigation of dual high power impulse magnetron sputtering with closed magnetic field during deposition of Ti–Cu thin films
    Journal of Applied Physics 108 (2010) 043305(1)-043305(8).
  47. V. Straňák, M. Čada, M. Quaas, S. Block, R. Bogdanowicz, Š. Kment, H. Wulff, Z. Hubička, Ch. A. Helm, M. Tichý, R. Hippler
    Physical properties of homogeneous TiO2 films prepared by high power impulse magnetron sputtering as a function of crystallographic phase and nanostructure
    Journal of Physics D: Applied Physics 42 (2009) 105204(1)-105204(12).
  48. V. Straňák, M. Quaas, H. Wulff, Z. Hubička, S. Wrehde, M. Tichý, R. Hippler
    Formation of TiOx films produced by high-power pulsed magnetron sputtering
    Journal of Physics D: Applied Physics 41 (2008) 055202(1)-055202(6).
  49. V. Straňák, J. Blažek, S. Wrehde, P. Adámek, Z. Hubička, M. Tichý, P. Špatenka, R. Hippler
    Study of Electronegative Ar/O2 discharge by means of Langmuir probe
    Contributions to Plasma Physics 48 (5-7) (2008) 503-508.
  50. V. Straňák, Z. Hubička, P. Adámek, J. Blažek, M. Tichý, P. Špatenka, R. Hippler, S. Wrehde
    Time-resolved probe diagnostics of pulsed DC magnetron discharge during deposition of TiOx layers
    Surface & Coatings Technology 201 (2006) 2512-2519.