Mgr. Zdeněk Hubička, Ph.D.

RV1_0403.jpg
Zástupce vedoucího sekce 4, Vedoucí oddělení 25
Category
Senior Scientist
Division (no.)
Department (no.)
Telephone
+420 266 05 2995, +420 266 05 2415, +420 266 05 2456
E-mail
hubicka [at] fzu.cz
Locality
Slovanka
Room
O 218
O 330
O 329

Publications

  1. R. Hippler, M. Čada, Z. Hubička
    Time-resolved diagnostics of a bipolar HiPIMS discharge
    Journal of Applied Physics 127 (2020) 303303(1)-203303(10).
  2. T. Kozák, A. D. Pajdarová, M. Čada, Z. Hubička, P. Mareš, J. Čapek
    Ion energy distributions at substrate in bipolar HiPIMS: effect of positive pulse delay, length and amplitude
    Plasma Sources Science and Technology 29 (2020) 065003(1)-065003(10).
  3. J. Olejníček, J. Šmíd, M. Čada, P. Kšírová, M. Kohout, R. Perekrestov, D. Tvarog, Š. Kment, H. Kmentová, Z. Hubička
    High rate deposition of photoactive TiO2 films by hot hollow cathode
    Surface & Coatings Technology 383 (2020) 125256(1)-125256(10).
  4. Z. Hubička, M. Zlámal, J. Olejníček, D. Tvarog, M. Čada, J. Krýsa
    Semiconducting p-Type Copper Iron Oxide Thin Films Deposited by Hybrid Reactive-HiPIMS + ECWR and Reactive-HiPIMS Magnetron Plasma System
    Coatings 10 (2020) 232(1)-232(14).
  5. Z. Hubička, M. Čada, A. Kapran, J. Olejníček, P. Kšírová, M. Zanáška, P. Adámek, M. Tichý
    Plasma Diagnostics in Reactive High-Power Impulse Magnetron Sputtering System Working in Ar + H2S Gas Mixture
    Coatings 10 (2020) 246(1)-246(17).
  6. R. Hippler, M. Čada, Z. Hubička
    Time-resolved Langmuir probe diagnostics of a bipolar high power impulse magnetron sputtering discharge.
    Applied Physics Letters 116 (2020) 064101(1)-064101(4).
  7. H. Hajihoseini, M. Čada, Z. Hubička, S. Ünaldi, M. A. Raadu, N. Brenning, J. T. Gudmundsson, D. Lundin
    Sideways deposition rate and ionized flux fraction in dc and high power impulse magnetron sputtering.
    Journal of Vacuum Science & Technology A 38 (2020) 033009(1)-033009(11).
  8. A. D. Pajdarová, T. Kozák, Z. Hubička, M. Čada, P. Mareš, J. Čapek
    Plasma parameters in positive voltage pulses of bipolar HiPIMS discharge determined by Langmuir probe with a sub-microsecond time resolution
    Plasma Sources Science and Technology 29 (2020) 085016(1)-085016(11).
  9. R. Hippler, M. Čada, V. Straňák, C. A. Helm, Z. Hubička
    Pressure dependence of singly and doubly charged ion formation in a HiPIMS discharge
    Journal of Applied Physics 125 (2019) 013301(1)-013301(7).
  10. M. Zanáška, Z. Turek, Z. Hubička, M. Čada, P. Kudrna, M. Tichý
    Floating harmonic probe for diagnostic of pulsed discharges
    Surface & Coatings Technology 357 (2019) 879-885.
  11. M. Dvořáková, R. Perekrestov, P. Kšírová, J. Balabánová, K. Jirátová, J. Maixner, P. Topka, J. Rathouský, M. Koštejn, M. Čada, Z. Hubička, F. Kovanda
    Preparation of cobalt oxide catalysts on stainless steel wire mesh by combination of magnetron sputtering and electrochemical deposition
    Catalysis Today 334 (2019) 13-23.
  12. Petr Sezemský, V. Straňák, Jiří Kratochvíl, M. Čada, R. Hippler, Miroslav Hrabovský, Z. Hubička
    Modified high frequency probe approach for diagnostics of highly reactive plasma
    Plasma Sources Science and Technology 28 (2019) 115009(1)-115009(10).
  13. J. Olejníček, J. Šmíd, R. Perekrestov, P. Kšírová, J. Rathouský, M. Kohout, M. Dvořáková, Š. Kment, K. Jurek, M. Čada, Z. Hubička
    Co3O4 thin films prepared by hollow cathode discharge
    Surface & Coatings Technology 366 (2019) 303-310.
  14. R. Hippler, M. Čada, V. Straňák, Z. Hubička
    Ion formation in an argon and argon-oxygen gas mixture of a magnetron sputtering discharge
    Journal of Physics Communications 3 (2019) 055011(1)-055011(9).
  15. Z. Hubička, M.Zlámal, M. Čada, Š. Kment, J.Krýsa
    Photo-electrochemical stability of copper oxide photocathodes deposited by reactive high power impulse magnetron sputtering
    Catalysis Today 328 (2019) 29-34.
  16. R. Perekrestov, A. Spesyvyi, J. Maixner, K. Mašek, O. Leiko, I. Khalakhan, J. Maňák, P. Kšírová, Z. Hubička, M. Čada
    The comparative study of electrical, optical and catalytic properties of Co3O4 thin nanocrystalline films prepared by reactive high-power impulse and radio frequency magnetron sputtering.
    Thin Solid Films 686 (2019) 137427(1)-137427(9).
  17. M. Zanáška, P. Kudrna, M. Čada, M. Tichý, Z. Hubička
    In-situ impedance spectroscopy of a plasma-semiconductor thin film system during reactive sputter deposition
    Journal of Applied Physics 126 (2019) 023301(1)-023301(12).
  18. H. Hajihoseini, M. Čada, Z. Hubička, S. Ünaldi, M. A. Raadu, N. Brenning, J. T. Gudmundsson, D. Lundin
    The Effect of Magnetic Field Strength and Geometry on the Deposition Rate and Ionized Flux Fraction in the HiPIMS Discharge
    Plasma 2 (2019) 201-221.
  19. K. Jirátová, R. Perekrestov, M. Dvořáková, J. Balabánová, P. Topka, M. Koštejn, J. Olejníček, M. Čada, Z. Hubička, F. Kovanda
    Cobalt Oxide Catalysts in the Form of Thin Films Prepared by Magnetron Sputtering on Stainless-Steel Meshes: Performance in Ethanol Oxidation
    Catalysts 9 (2019) 806-824.
  20. R. Hippler, M. Čada, V, V. Straňák, Z. Hubička
    Time-resolved optical emission spectroscopy of a unipolar and a bipolar pulsed magnetron sputtering discharge in an argon/oxygen gas mixture with a cobalt target
    Plasma Sources Science and Technology 28 (2019) 115020(1)-115020(13).
  21. V. Straňák, R. Bogdanowicz, P. Sezemsky, H. Wulff, A. Kruth, M. Smietana, J. Kratochvil, M. Čada, Z. Hubička
    Towards high quality ITO coatings: The impact of nitrogen admixture in HiPIMS discharges
    Surface & Coatings Technology 335 (2018) 126-133.
  22. M. Zanáška, Z. Hubička, M. Čada, P. Kudrna, M. Tichý
    Floating harmonic probe measurements in the low-temperature plasma jet deposition system
    Journal of Physics D: Applied Physics 51 (2018) 025205(1)-025205(8).
  23. V. Straňák, Z. Hubička, M. Čada, R. Bogdanowicz, H. Wulff, C. A. Helm, R. Hippler
    Influence of reactive oxygen species during deposition of iron oxide films by high power impulse magnetron sputtering
    Journal of Physics D: Applied Physics 51 (2018) 095205(1)-095205(12).
  24. J. Olejníček, M. Zlámal, Z. Hubička, R.Perekrestov, P. Kšírová, M. Čada, Š. Kment, J.Krýsa
    Fe-Ti alloy layer plasma deposition – Monitoring of plasma parameters and properties of deposited alloys, anodization and photoelectrochemical characterization
    Catalysis Today 313 (2018) 239-244.
  25. H. Kmentová, Š. Kment, Z. Hubička, Z. Remeš, J. Olejníček, M. Čada, J. Krýsa, R. Zbořil
    Thermal sulfidation of α-Fe2O3 hematite to FeS2 pyrite thin electrodes: Correlation between surface morphology and photoelectrochemical functionality
    Catalysis Today 313 (2018) 224-230.
  26. J.Krýsa, A. Němečková, M. Zlámal, T. Kotrla, M. Baudys, Š. Kment, Z. Hubička, M. Neumann-Spallart
    a-Fe2O3/TiO2 stratified photoanodes.
    Journal of Photochemistry and Photobiology A-Chemistry 366 (2018) 12-17.
  27. M. Zelný, Š. Kment, R. Čtvrtlík, Š. Pausova, H. Kmentova, J. Tomaštík, Z. Hubička, Y. Rambabu, J. Krýsa, A. Naldoni, P. Schmuki, R. Zboril
    TiO2 Nanotubes on Transparent Substrates: Control of Film Microstructure and Photoelectrochemical Water Splitting Performance
    Catalysts 8 (2018)25.
  28. P. Adámek, J. Olejníček, Z. Hubička, M. Čada, Š. Kment, M. Kohout, H.T. Do
    System for time-resolved laser absorption spectroscopy and its application to high-power impulse magnetron sputtering
    Review of Scientific Instruments 88 (2017) 023105-1-023105-8.
  29. J. Olejníček, M. Dvořáková, Š. Kment, Z. Hubička, H. Kmentová, P. Kšírová, M. Čada, M. Zlámal, J. Krýsa
    WO3 thin films prepared by sedimentation and plasma sputtering
    Chemical Engineering Journal 318 (2017) 281-288.
  30. V. Straňák, J. Kratochvíl, J. Olejníček, P. Kšírová, P. Sezemský, M. Čada, Z. Hubička
    Enhanced oxidation of TiO2 films prepared by high power impulse magnetron sputtering running in metallic mode
    Journal of Applied Physics 121 (2017) 171914(1)-171914(9).
  31. M. Čada, D. Lundin, Z. Hubička
    Measurement and modeling of plasma parameters in reactive high-power impulse magnetron sputtering of Ti in Ar/O2 mixtures
    Journal of Applied Physics 121 (2017) 171913(1)-171913(7).
  32. R. Hippler, Z. Hubička, M. Čada, P. Kšírová, H. Wulff, C. A. Helm, V. Straňák
    Angular dependence of plasma parameters and film properties during high power impulse magnetron sputtering for deposition of Ti and TiO2 layers
    Journal of Applied Physics 121 (2017) 171906(1)-171906(9).
  33. R. Hippler, M. Čada, V. Straňák, Z. Hubička, C.A. Helm
    Pressure dependence of Ar2+, ArTi+, and Ti2+ dimer formation in a magnetron sputtering discharge
    Journal of Physics D: Applied Physics 50 (2017) 445205(1)-445205(8).
  34. P. Klein, J. Hnilica, Z. Hubička, M. Čada, M. Šlapanská, M. Zemánek, P. Vašina
    Cathode voltage and discharge current oscillations in HiPIMS
    Plasma Sources Science and Technology 26 (2017) 055015(1)-055015(12).
  35. D. Lundin, M. Čada, Z. Hubička
    Time-resolved ion flux and impedance measurements for process characterization in reactive high-power impulse magnetron sputtering
    Journal of Vacuum Science & Technology A 34 (2016) 041305(1)-041305(10).
  36. Q. Fu, G. S. Lorite, Md. M. Rashid, R. Neuhaus, M. Čada, Z. Hubička, O. Pitkänen, T. Selkälä, J. Uusitalo, C. Glanz, I. Kolaric, K. Kordas, C.-M. Nicolescu, G. Toth
    High dynamic stiffness mechanical structures with nanostructured composite coatings deposited by high power impulse magnetron sputtering
    Carbon 98 (2016) 24-33.
  37. Š. Kment, Z. Hubička, J. Krysa, D. Sekora, M. Zlámal, J. Olejníček, M. Čada, P. Kšírová, Z. Remeš, P. Schmuki, E. Schubert, R. Zbořil
    On the improvement of PEC activity of hematite thin films deposited by high-power pulsed magnetron sputtering method
    Applied Catalysis B: Environmental 165 (2015) 344-350.
  38. D. Lundin, M. Čada, Z. Hubička
    Ionization of sputtered Ti, Al, and C coupled with plasma characterization in HiPIMS
    Plasma Sources Science and Technology 24 (2015) 035018(1)-035018(11).
  39. M. Čada, Z. Hubička, P. Adámek, J. Olejníček, Š. Kment, J. Adámek, J. Stöckel
    A modified Katsumata probe - Ion sensitive probe for measurement in non-magnetized plasmas
    Review of Scientific Instruments 86 (2015) 073510(1)-073510(7).
  40. Š. Kment, P. Schmuki, Z. Hubička, L. Machala, R. Kirchgeorg, N. Liu, L. Wang, K. Lee, J. Olejníček, M. Čada, I. Gregora, R. Zbořil
    Photoanodes with Fully Controllable Texture: The Enhanced Water Splitting Efficiency of Thin Hematite Films Exhibiting Solely (110) Crystal Orientation
    ACS Nano 9 (2015) 7113-7123.
  41. P. Dytrych, P. Klusoň, O. Šolcová, Š. Kment, V. Straňák, M. Čada, Z. Hubička
    Shape selective photoinduced electrochemical behavior of thin ZnO layers prepared by surfatron
    Thin Solid Films 597 (2015) 131-139.
  42. M. Dvořáková, Z. Hubička, Š. Kment, J. Olejníček, M. Čada, P. Kšírová, J. Krýsa
    Semiconducting WO3 thin films prepared by pulsed reactive magnetron sputtering
    Research on Chemical Intermediates 41 (2015) 9259-9266.
  43. L. Wang, C.Y. Lee, R. Kirchgeorg, N. Liu, K. Lee, Š. Kment, Z. Hubička, J. Krýsa, J. Olejníček, M. Čada, R. Zbořil, P. Schmuki
    Anodic self-organized transparent nanotubular/porous hematite films from Fe thin-films sputtered on FTO and photoelectrochemical water splitting
    Research on Chemical Intermediates 41 (2015) 9333-9341.
  44. Š. Kment, H. Kmentová, Z. Hubička, J. Olejníček, M. Čada, J. Krýsa
    Enhanced photocatalytic activity of silver-doped nanoparticulate TiO2 thin films with respect to the method of doping
    Research on Chemical Intermediates 41 (2015) 9343-9355.
  45. J. Alami, V. Straňák, A.P. Herrendorf, Z. Hubička, R. Hippler
    Design of magnetic field configuration for controlled discharge properties in highly ionized plasma.
    Plasma Sources Science and Technology 24 (2015) 045016(1)-045016(10).
  46. J. Krýsa, M. Zlámal, Š. Kment, M. Dvořáková, Z. Hubička
    TiO2 and Fe2O3 Films for Photoelectrochemical Water Splitting.
    Molecules 20 (2015) 1046-1058.
  47. V. Straňák, S. Drache, H. Wulff, Z. Hubička, M. Tichý, A. Kruth, Ch. A. Helm, R. Hippler
    Oxidation behavior of Cu nanoparticles embedded into semiconductive TiO2 matrix.
    Thin Solid Films 589 (2015) 864-871.
  48. M. Kohout, J. Olejníček, J. Šmíd, M. Čada, Š. Kment, P. Kšírová, M. Dvořáková, Z. Hubička
    ZnO thin films prepared by multi SWD plasma jet system
    Jemná mechanika a optika 59 (2014) 38-42.
  49. J. Olejníček, J. Šmíd, M. Čada, Š. Kment, O. Churpita, P. Kšírová, M. Dvořáková, P. Adámek, M. Kohout, V. Valvoda, D. Chvostová, M. Zlámal, Z. Hubička
    ZnO thin films prepared by surfatron produced discharge
    Catalysis Today 230 (2014) 119-124.
  50. Š. Kment, H. Kmentová, A. Sarkar, R.J. Soukup, N.J. Ianno, D. Sekora, J. Olejníček, P. Kšírová, J. Krysa, Z. Remeš, Z. Hubička
    Epoxy catalyzed sol–gel method for pinhole-free pyrite FeS2 thin films
    Journal of Alloys and Compounds 607 (2014) 169-176.