Study of pulsed plasma systems for thin film deposition for photonic applications

The solution of the project is focused on experimental research of low-temperature pulsed plasma generated in systems with a planar magnetron and a hollow cathode. Advanced methods of plasma diagnostics will be applied in deposition plasma systems during reactive pulse sputtering of dielectric thin films. Plasma systems, even in a hybrid arrangement, will be optimized for deposition of mainly Fe2O3 or Fe1-xZnxO layers, which will then be sulfurized to FeS2 or Fe1-xZnxS as a promising material for cheap production of a thin-film photovoltaic cell. The research will also focus on the preparation of thin films of ZnO, TiO2, etc. as suitable candidates for the resulting formation of a heterogeneous P-N transition. The deposited layers will be characterized by a number of advanced techniques. In the project, we propose to use in mutual synergy the experience of three workplaces that have been cooperating for a long time - Faculty of Mathematics and Physics, Charles University in Prague, Institute of Physics AS CR in Prague and Faculty of Science MU in Brno.