Mgr. Martin Čada, Ph.D.

Summary

Research and development of sputtering techniques for thin film deposition and advanced low-temperature plasma diagnostics.

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Martin Čada
Pracovní pozice
Deputy Head of Department, Head of Scientific group
Category
Senior Scientist
Division (no.)
Laboratory / Scientific group
E-mail
cada [at] fzu.cz
Locality
Slovanka
Room
O 331
O 329
O 218
Name Provider and programme Investigator from FZU Datum zahájení Datum ukončení
High entropy disulfides: a new class of 2D materials (SHIELD) running GACR » Standard 1. 1. 2025 31. 12. 2027
Thin-film tensometric sensors with high sensitivity and durability prepared by magnetron sputtering (Senzor) running TACR » TREND 1. 3. 2023 30. 6. 2026
Innovative plasma-chemical and chemical synthesis of nickel-containing mixed oxide catalysts for the oxidation of volatile organic pollutants GACR » Standard 1. 1. 2021 31. 12. 2023
Minimal Fab "Design" of the plasma enhanced atomic layer deposition system (Minimal Fab ALD) TACR » DELTA 2 1. 1. 2020 30. 6. 2022
Advanced diagnostics of reactive HiPIMS plasma for deposition of oxide, nitride and sulphide layers GACR » Standard 1. 1. 2019 31. 12. 2021
Research and development of novel pulsed plasma technologies for deposition of advanced thin-film materials MPO » TRIO 1. 1. 2018 31. 12. 2021
Advanced preparation of catalytically active oxides on metal supports using plasma deposition and chemical methods GACR » Standard 1. 1. 2017 31. 12. 2019
Research and development of a new plasma activated ALD deposition system with a unique source of low-temperature plasma based on a microwave surfatron and ECWR discharge. TACR » DELTA 1. 11. 2016 31. 10. 2019
Study of pulsed plasma systems for thin film deposition for photonic applications GACR » Standard 1. 1. 2015 31. 12. 2017
Výzkum hybridních HiPIMS systémů určených pro depozice nanostrukturovaných tenkých vrstev MEYS » Programmes of International Cooperation - COST CZ 1. 3. 2012 30. 6. 2013
Advanced experimental research of plasma discharge sources used for the preparation of nanostructured thin films GACR » Standard 1. 1. 2011 31. 12. 2013
Research of low temperature plasma parameters in planar magnetron systems, hollow cathode systems and microwave surfatron systems. GACR » Postdoctoral 2009 2011