1. A. Kapran, R. Hippler, H. Wulff, J. Olejníček, L. Volfová, A. Písaříková, N. Nepomniashchaia, M. Čada, Z. Hubička
    Crystalline Structure and Optical Properties of Cobalt Nickel Oxide Thin Films Deposited with a Pulsed Hollow-Cathode Discharge in an Ar+O2 Gas Mixture
    Coatings 14 (2024) 319(1)-319(10).
  2. A. Kapran, V. G. Antunes, Z. Hubička, C. Ballage, T. Minea
    Investigation of the magnetron balancing effect on the ionized flux fraction and deposition rate of sputtered titanium species for the high-power impulse magnetron sputtering pulses of different lengths
    Journal of Vacuum Science & Technology A 41 (2023) 013003(1)-013003(8).
  3. V. G. Antunes, M. Rudolph, A. Kapran, H. Hajihoseini, M. A. Raadu, N. Brenning, J. T. Gudmundsson, D. Lundin, T. Minea
    Influence of the magnetic field on the extension of the ionization region in high power impulse magnetron sputtering discharges
    Plasma Sources Science and Technology 32 (2023) 075016(1)-075016(10).
  4. K. Jirátová, P. Soukal, A. Kapran, T. Babii, J. Balabánová, M. Koštejn, M. Čada, J. Maixner, P. Topka, Z. Hubička, F. Kovanda
    Nickel-Copper Oxide Catalysts Deposited on Stainless Steel Meshes by Plasma Jet Sputtering: Comparison with Granular Analogues and Synergistic Effect in VOC Oxidation
    Catalysts 13 (2023) 595(1)-595(21).
  5. A. Kapran, R. Hippler, H. Wulff, J. Olejníček, A. Písaříková, M. Čada, Z. Hubička
    Characteristics of a pulsed hollow cathode discharge operated in an Ar+O2 gas mixture and deposition of copper nickel oxide thin films
    Vacuum 215 (2023) 112272(1)-112272(11).
  6. Z. Hubička, M. Čada, A. Kapran, J. Olejníček, P. Kšírová, M. Zanáška, P. Adámek, M. Tichý
    Plasma Diagnostics in Reactive High-Power Impulse Magnetron Sputtering System Working in Ar + H2S Gas Mixture
    Coatings 10 (2020) 246(1)-246(17).