Low-temperature plasma deposition of perovskite thin films on metal and polymer substrates (GACR bilaterální projekt GACR-DFG)

Sputtering of complex oxides on metal and polymer substrates provides an important extension of thin film technology to allow the use of substrates better suited for the application, such as metal and polymer films. The proposed project deals with research and optimization of plasma jet technologies for low-temperature deposition of perovskite thin films on metal and polymer substrates. In-situ plasma diagnostics will be performed directly during deposition, in particular by emission spectroscopy, time-resolved Langmuir probe and mass spectroscopy in order to better understand the elementary processes in reactive plasma. To better understand the processes of physical and chemical interaction between the deposited layer and the substrate under low temperature deposition conditions, microstructure measurements and compositional characteristics will be performed using XRD, XPS, GD-OES, SIMS, SEM and TEM. Optical, dielectric and photoelectric properties will be measured by ellipsometry, spectrophotometry and dielectric measuring systems, ferroelectric properties by PE and CV hysteresis measurements, domain structure and piezoelectric properties by nanointend (elastic properties), VASE (optical properties) and LIMM (spontaneous polarization). It will develop a functional prototype and build a device to demonstrate its functions.